Cymer, Inc.

James J Ferrell

Thomas Patrick Duffey

Richard L Sandstrom

Robert A Bergstedt

Rajasekhar Rao

Hong Ye

Daniel Brown

John Viatella

Slava Rokitski

Alex Ershov

Rong (Lauren) Liu

Ray Cybulski

William N Partlo

Alexander Igorevich Ershov

Daniel J W Brown

Thomas Hofmann

Bryan George Moosman

Daniel J Reiley

Tae H Chung

Terance Hilsabeck

Christopher R Remen

Chris R Remen

An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.

Very high power laser chamber optical improvements

One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.

Gas discharge laser chamber

An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

High power excimer laser with a pulse stretcher

Growing community of inventors

Temecula, CA, United States of America

James J Ferrell