American Air Liquide, Inc.

L'air Liquide, Soci&#xe9;t&#xe9; Anonyme Pour L'etude Et L'exploitation Des Proc&#xe9;d&#xe9;s Georges Claude

Other

James J F McAndrew

Taekyu Kang

Christian Dussarrat

Remi Tsiava

Remi Pierre Tsiava

Ronald S Inman

Youssef Joumani

Curtis Anderson

Ryan B Adelman

Henri Chevrel

Jiefu Ma

Jean-Marc Girard

Tracey Jacksier

Benjamin Jurcik

Carol Ann Schnepper

Dmitry Znamensky

Francois Doniat

Jean Friedt

Benjamin J Jurcik

François Doniat

A radiative recuperator preheats oxidant and/or fuel for combustion at one or more burners of a furnace. The recuperator includes a duct, at least portions of which comprise a material having a thermal conductivity of greater than 1 W/(m&#xb7;K), preferably greater than 3 W/(m&#xb7;K), that receives hot flue gas produced by the burner(s). The duct radiatively transfers heat to oxidant or fuel (for preheating) flowing through one or more metallic pipes disposed in between the duct and an insulating wall.

Furnace with integrated heat recovery utilizing radiative recuperator for preheating combustion reactants using heat from flue gas

A plurality of independently flow rate-controlled flows of oxidant may be preheated at a heat exchanger (or both oxidant and fuel at separate heat exchangers) by heat exchange with a hot shell-side (heat transfer) fluid. The separate flows of hot oxidant are directed to associated separate burners where they combust with flows of fuel to produce hot combustion gases. The hot combustion gases are used to preheat the hot shell-side fluid at a recuperator or regenerator.

Method and system for heat recovery from products of combustion and charge heating installation including the same

A plurality of independently flow rate-controlled flows of fuel may be preheated at a heat exchanger (or both oxidant and fuel at separate heat exchangers) by heat exchange with a hot shell-side (heat transfer) fluid. The separate flows of hot fuel are directed to associated separate burners where they combust with flows of fuel to produce hot combustion gases. The hot combustion gases are used to preheat the hot shell-side fluid at a recuperator or regenerator.

Disclosed herein are mono-functional silylating compounds that may exhibit enhanced silylating capabilities. Also disclosed are method of synthesizing and using these compounds. Finally methods to determine effective silylation are also disclosed.

Cyclic amino compounds for low-k silylation

Disclosed are precursors that are adapted to deposit SiCOH films with dielectric constant and Young's Modulus suitable for future generation dielectric films.

Vapor deposition methods of SiCOH low-k films

Disclosed herein are precursors and methods for their use in the manufacture of semiconductor, photovoltaic, TFT-LCD, or flat panel type devices.

Volatile precursors for deposition of C-linked SiCOH dielectrics

Provided is a novel semiconductor processing system. The system includes a process chamber for treating a semiconductor substrate with one or more process gases comprising water vapor, means for delivering the water vapor or one or more precursors thereof to the process chamber, an exhaust conduit connected to the process chamber, an absorption spectroscopy system for sensing water vapor in a sample region, and a control system which controls water vapor content in the process chamber. Also provided is a method for controlling the water vapor level in a semiconductor process chamber. The system and method allow for measurement and control of the water vapor level in a semiconductor processing chamber in which water vapor is present as a process gas.

Semiconductor processing system and method for controlling moisture level therein

Provided are novel methods of preventing deposition on an optical component in an absorption spectroscopy measurement cell. The methods involve performing an absorption spectroscopy measurement of a sample gas introduced into the cell, and introducing a flow of purge gas from a purge gas inlet pipe across a critical surface of the optical element at a velocity effective to prevent deposition on the critical surface. The gas inlet is disposed adjacent said critical surface. Also provided are devices for practicing the inventive method, measurement cells useful in absorption spectroscopy measurements, apparatuses for performing an absorption spectroscopy measurement and semiconductor processing apparatuses. The invention allows for the performance of accurate spectroscopic measurements. Because deposits are prevented from forming on the surface of an optical element, interference therefrom can effectively be avoided.

Method and system for preventing deposition on an optical component in a spectroscopic sensor

Provided is a novel in-line cell useful in absorption spectroscopy. The cell includes a sample region, a light entry port and a light exit port being the same or separate ports. Each port is in communication with the sample region and contains a light transmissive window. A mirror having a light reflective surface faces the sample region, and a heater effective to heat the light reflective surface is provided. The cell can be used to determine the concentration of molecular gas impurities in a sample. Particular applicability is found in semiconductor processing.

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Chadds Ford, PA, United States of America

James J F McAndrew