Semitool, Inc.

James J Erickson

Daniel J Woodruff

Matthew C Egloff

Gregory J Wilson

Paul R McHugh

Randy Harris

Thomas H Oberlitner

John M Pedersen

Nolan Layne Zimmerman

Steve L Eudy

Douglas W Carr

David P Mattson

Jeffry Alan Davis

Although there are several inventions disclosed herein, the present application is directed to a reactor for electrochemically processing a microelectronic workpiece. The reactor comprises a movable electrode assembly that is disposed for movement along a motion path. The motion path includes at least a portion thereof over which the electrode assembly is positioned for processing at least one surface of the microelectronic workpiece. A cleaning electrode is located along the motion path of the movable electrode assembly. In one embodiment, a programmable controller is connected to direct the movable electrode assembly to move to the cleaning electrode during a cleaning cycle. At that time, the programmable controller connects the movable electrode assembly as an anode and the cleaning electrode as a cathode for cleaning of the movable electrode assembly. The cleaning electrode may be disposed along a position of the motion path that is beyond the range of motion required to process the microelectronic workpiece so that the programmable controller may be programmed to conduct a cleaning cycle while a microelectronic workpiece is present in the reactor for processing.

Processing apparatus including a reactor for electrochemically etching microelectronic workpiece

Tools having mounting modules with registration systems are disclosed. The mounting module includes positioning elements for precisely locating a processing chamber and a transport system that moves workpieces to and from the processing chamber. The relative positions between positioning elements of the module are fixed so that the transport system does not need to be recalibrated when the processing chamber is removed and replaced with another processing chamber. The processing chamber includes a paddle device for agitating processing liquid at a process surface of the workpiece. The paddle device, the processing chamber, and electrodes within the processing chamber are configured to reduce the likelihood for electrical shadowing created by the paddles at the surface of the workpiece, and to account for three-dimensional effects on the electrical field as the paddles reciprocate relative to the workpiece.

Integrated microfeature workpiece processing tools with registration systems for paddle reactors

Paddles and enclosures for processing microfeature workpieces are disclosed. A paddle device having multiple paddles is positioned in an enclosure to reciprocate back and forth along a generally linear path. The clearances between the paddles, the workpiece and the walls of the chamber are relatively small to increase the flow agitation at the surface of the workpiece and enhance the mass transfer process occurring there. The paddles are shaped to reduce or eliminate electrical shadowing effects created at the surface of the workpiece during electrochemical processing. Paddles on the same paddle device may have different shapes to reduce the likelihood for creating three-dimensional effects in the flow field proximate to the surface of the workpiece. The reciprocation stroke of the paddles may shift to further reduce shadowing.

Paddles and enclosures for enhancing mass transfer during processing of microfeature workpieces

Reactors having multiple electrodes and/or enclosed reciprocating paddles are disclosed. The reactor can include multiple electrodes spaced apart from a process location to provide virtual electrodes proximate to the process location for transferring material to or from the workpiece. A magnet may be positioned proximate to the process plane to orient magnetically sensitive material deposited on the workpiece. The electrodes may be removable from the reactor without passing them through the magnet to reduce interference between the electrodes and the magnet. The workpiece may be carried by a rotatable workpiece support to orient the workpiece for processing. At least one of the electrodes can operate as a current thief to reduce terminal effects at the periphery of the workpiece. An electric field control element positioned between the electrodes and the workpiece circumferentially varies the effect of the thieving electrode current to account for effects created by elongated paddles as they oscillate proximate to the workpiece.

Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods

End-effectors may be used to grasp microelectronic workpieces for handling by automated transport devices. One such end-effector includes a plurality of abutments and a detector adapted to detect engagement of the edge of the workpiece by at least one of the abutments.

End-effectors for handling microelectronic wafers

An integrated tool and automatic calibration systems that enable wet chemical processing chambers, lift-rotate units and other hardware to be quickly interchanged without having to recalibrate the transport system or other components to the replacement items. These tools are expected to reduce the down time associated with repairing or maintaining processing chambers and/or lift-rotate units so that the tools can maintain a high throughput. Several aspects of these tools are particularly useful for applications that have stringent performance requirements because components are more likely to require maintenance more frequently, and reducing the down time associated with maintaining such components will significantly enhance the integrated tool.

Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces

A method and apparatus for transmitting electrical signals and fluids to and/or from a microelectronic workpiece. An apparatus in accordance with one embodiment of the invention includes a shaft rotatable about a shaft axis and having a first end with a first electrical contact portion toward the first end, a second end opposite the first end, and an internal channel along the shaft axis between the first and second ends. The shaft can further have at least one first hole toward the first end with the first hole extending radially from the channel to an external surface of the shaft. The shaft can still further have at least one second hole toward the second end with the second hole extending from the channel to the external surface. A housing rotatably receives the shaft and has an aperture coupleable to a fluid source and/or fluid sink. The housing further has a fluid passage positioned adjacent to at least one of the first holes of the shaft and in fluid communication with the aperture when the shaft rotates relative to the housing. The housing also has a second electrical contact portion engaged with the first electrical contact portion to transmit electrical signals between the first and second electrical contact portions while the shaft rotates relative to the housing.

Apparatus for providing electrical and fluid communication to a rotating microelectronic workpiece during electrochemical processing

Method for providing electrical and fluid communication to a rotating microelectronic workpiece during electrochemical processing

End-effectors may be used to grasp microelectronic workpieces for handling by automated transport devices. One such end-effector includes a plurality of end-effectors and a detector adapted to detect engagement of the edge of the workpiece by at least one of the abutments. An alternative end-effector includes at least three abutments, at least one of which is resiliently connected to an actuator for movement between a retracted position and a deployed position wherein it engages a workpiece.

End-effectors for handling microelectronic workpieces

Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems

Passive end-effectors for handling microelectronic workpieces having a perimeter edge circumscribing a first diameter. In one embodiment, a passive end-effector in accordance with the invention includes a body having a plurality of contact sites located along a circle corresponding to the first diameter of the workpiece. The body, for example, can be a paddle or a fork. The passive end-effector can also include a plurality of passive abutments that are carried by the body. The abutments are located along the circle, and the abutments are configured to support the workpiece in a plane spaced apart from the body. The abutments, for example, can each include an inclined surface that slopes downwardly toward a central region of the circle to support only the edge of the workpiece in a manner that suspends or otherwise spaces the workpiece in a plane that is spaced apart from the body. The passive end-effector can further include a sensor assembly that is carried by the body. The sensor includes an engagement member positioned at least partially within the circle, and the engagement member is configured to move generally transverse to the plane as the workpiece is loaded on and unloaded from the end-effector. The passive end-effector does not include an active member that exerts a force against the edge of the workpiece parallel to the plane of the workpiece.

Growing community of inventors

Kalispell, MT, United States of America

James J Erickson