Asml Holding N.v.

Other

Asml Netherlands B.v.

James Hamilton Walsh

Yuli Vladimirsky

Peter Conrad Kochersperger

Joseph Harry Lyons

Justin Lloyd Kreuzer

Lev Ryzhikov

Michal Emanuel Pawlowski

Rajan Mali

Roberto B Wiener

Aage Bendiksen

Martinus Cornelis Reijnen

Arun Mahadevan Venkataraman

Richard John Johnson

Andrew Judge

Erik Johan Arlemark

Kirill Urievich Sobolev

Stanley G Janik

Christopher Michael Dohan

Christopher Rossi Vann

Ravi Chaitanya Kalluri

Nicolae Marian Ungureanu

An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

Method for region of interest processing for reticle particle detection

An inspection system (), a lithography apparatus, and an inspection method are provided. The inspection system () includes an illumination system (), a detection system (), and processing circuitry (). The illumination system generates a first illumination beam () at a first wavelength and a second illumination beam () at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object () simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation () scattered by a particle () present at a surface () of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

Contaminant identification metrology system, lithographic apparatus, and methods thereof

An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.

Apparatus for and method cleaning a support inside a lithography apparatus

An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.

Apparatus including a gas gauge and method of operating the same

An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position.

Compact two-sided reticle inspection system

Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imageable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imageable radiation from the wide angle input lens group and focus the imageable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

Optical system, inspection system and manufacturing method

Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more, from an object surface, and produce imagable radiation. The wide angle input lens group is arranged such that no intermediate focused image is formed within or after the wide angle input lens group. The output lens group is configured to receive the imagable radiation from the wide angle input lens group and focus the imagable radiation onto an image plane to image at least part of the object surface. A detector receives the image of the at least part of the object surface and, based on the received image, detects, for example, contamination on the object surface.

Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device.

Particle detection on an object surface

A choked-flow orifice gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with a choked flow orifice. The use of a choked flow orifice provides for reduced equipment cost and improved system reliability. A gas supply forces gas into the proximity sensor. The gas is forced through the choked flow orifice to achieve sonic conditions at which time the mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor channel system. A mass flow sensor within the sensor channel system monitors flow rates to detect measurement standoffs that can be used to initiate a control action.

Pressure sensor

A vacuum-driven gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the vacuum-driven gas gauge proximity sensor uses a vacuum to reverse the traditional flow of gas through a proximity sensor, such that gas flows inward across measurement and reference standoffs through measurement and reference nozzles. The conditioned ambient gas that is vacuumed into the reference and measurement nozzles flows through reference and measurement channels that are coupled at a junction into a single channel. The single channel is coupled to the vacuum that is used to evacuate the conditioned ambient gas through the proximity sensor. A bridge channel couples the reference and measurement channels. A mass flow sensor along the bridge channel monitors flow rates to detect measurement standoffs that can be used to initiate a control action. A pump-driven liquid flow proximity sensor is also disclosed.

An expanding anchor assembly which after securement can be simply released and immediately easily removed by hand from its embedment matrix substrate without damage to itself, the hole in which it was secured or the matrix substrate in which it was embedded. The anchor assembly 1 comprises one separate tubular sleeve 2, with a bore through its entire length, and another separate elongated cylindrical plug 3. Sleeve 2 has one integral securing component 4 end with parallel longitudinal slots 8 forming a plurality of resilient radially expanable tabs 9 with single internal circumferential protrusions 7 located a predetermined distance from their free end. The other integral joining component 5 end has a means of attaching selected separate objects thereto. Plug 3 is of a length equal to or less than the aforestated protrusion 7's predetermined distance and a diameter movable through bore of sleeve 2. In function, plug 3, in its movement within bore of sleeve 2 toward securing component 4, results in interference with protrusions 7 expanding tabs 9 radially outward to secure anchor assembly in hole 10 of matrix 11 substrate. The continued movement of plug 3 past protrusions 7 allows tabs 9 to contract radially inward simultaneously entrapping plug 3 and releasing anchor assembly 1 for its subsequent removal.

Removable anchor tube assembly

A solar corrugation with shield, which is a stationary device with no moving parts, controls the transmission of solar radiant energy on a supply and demand relationship throughout the seasons of the year. The corrugation has a ninety degree, or thereabouts, angle between its two planar sides, or panes, with one pane being exposed to and the other pane being protected from solar radiant energy. The corrugation is composed of a material transparent to solar radiant energy. The shield is a planar plate, or shield, so positioned to protect the protected pane of the corrugation. The shield, in its position, is separated from the protected pane of the corrugation by an air space. The shield is composed of a material opaque to and absorbent of solar radiant energy.

Solar corrugation with shield

A removable anchor assembly has an elongated hollow tube including integral upper and lower portions with at least the lower portion exhibiting resilience to lateral deflection of segments of the walls thereof. The lower portion normally changes in a diameter progressively from near the junction with the upper portion, and the upper portion generally has predetermined internal and external diameters. Longitudinal slots are spaced around the lower portion, and a laterally facing ridge on the lower portion has a normal diameter related to the exterior diameter of the upper portion. A rigid plug is movable through the upper portion and has a diameter functionally the same as that of the internal tube diameter at the upper end of the lower portion. The plug is insertable within the lower portion to wedge the walls thereof outwardly and expand the ridge diameter to an enlarged amount. The plug later may be engaged so as to permit its withdrawal and consequent contraction of the ridge in an amount to enable removal of the anchor from an opening in which it has been secured. One approach at construction forms the ridge and the tapering by means of tool and die operations, another specific approach involves the use of thread rolling, and a third approach is by way of cutting or punching operations.

Growing community of inventors

Newtown, CT, United States of America

James Hamilton Walsh