Intel Corporation

James Graeber

Ranjith Kumar

Srinivasa Chaitanya Gadigatla

Abhinand Ramakrishnan

Kohinoor Basu

Tamanna Husain

An integrated circuit structure includes a first metal level comprising a first plurality of interconnect lines along a first direction. A cell is on at least the first metal level, the cell having a pin comprising more than two of the first plurality of interconnect lines. A second metal level comprising a second plurality of interconnect lines overlays the first metal level, where the second plurality of interconnect lines is along a second direction. Two or more vias are on at least one of the second plurality of interconnect lines to connect to the pin.

Growing community of inventors

Folsom, CA, United States of America

James Graeber