Rohm & Haas Electronic Materials LLC

Shipley Company LLC

Other

La Jolla Cancer Research Foundation

Dupont Electronic Materials International, LLC

Dow Global Technolgoies LLC

Sri International

Cameron Pace Group LLC

International Business Machines Corporation

Globalfoundries Inc.

Vincent Pace & James Cameron

James F Cameron

James W Thackeray

Suzanne M Coley

Shintaro Yamada

Paul J LaBeaume

Emad Aqad

Li Cui

Vipul Jain

Owendi Ongayi

Jin Wuk Sung

Sheng Liu

Patrick J Campbell

Roger F Sinta

Vincent Mario Pace

Charlotte A Cutler

David A Valeri

Gerhard Pohlers

John Paul Amara

Keren Zhang

Iou-Sheng Ke

Mingqi Li

William Williams, Iii

Daniel Greene

Magnus Pfahl

George W Orsula

Ling Jong

Gregory P Prokopowicz

Xiao-kun Zhang

Peter D Hobbs

James Michael Mori

Amy M Kwok

Joshua A Kaitz

Wu-Song S Huang

George G Barclay

Marcia I Dawson

Jurgen M Lehmann

Ronnie Allum

Peter Trefonas, Iii

Christopher D Gilmore

Ke Yang

Ahmad E Madkour

Christopher P Sullivan

Martha M Rajaratnam

Mitsuru Haga

Shugaku Kushida

Kunio Kainuma

Greogory P Prokopowicz

Wayne Martin Moreau

Pushkara Rao Varanasi

Deyan Wang

Hiroshi Ito

Cong Liu

Gary Ganghui Teng

Anthony Zampini

Jean M Frechet

Jong Keun Park

Kuang-Jung Chen

Charles R Szmanda

Ahmad D Katnani

Scott Arthur MacDonald

Carlton G Willson

Wenjie Li

Timothy G Adams

Willard E Conley

Libor Vyklicky

Ronald Anthony DellaGuardia

Gary N Taylor

Qing Min Wang

Robert David Grober

Dana A Gronbeck

Irene Popova

Sheri L Ablaza

Xisen Hou

Choong-Bong Lee

Thomas M Zydowsky

Marcia L Dawson

Ping Ding

Michael F Cronin

Tomas Marangoni

Charles R Kinzie

Yoshihiro Yamamoto

Gilbert D Feke

Peter R Hagerty

Young-Seok Kim

Paul J Labeaume

Gary J Swanson

J Urgen Lehmann

Claus-Peter Niesert

Man-Kit Leung

ChoongBong Lee

Brandon Wenning

Tsutomu Asazuma

Dan B Millward

Vince Pace

Guangyu Xu

Dong Woo Lee

David A Valei

Irene Y Popova

Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

Aromatic underlayer

A photoresist underlayer composition comprising a poly(arylene ether); an additive of formula (14):D-(L-Ar—[X])  (14); anda solvent, wherein, in formula (14), D is a substituted or unsubstituted Corganic group, optionally wherein D is an organic acid salt of the substituted or unsubstituted Corganic group; each Lis independently a single bond or a divalent linking group, when Lis a single bond, D may be a substituted or unsubstituted Ccycloalkyl or substituted or unsubstituted Cheterocycloalkyl that is optionally fused with Ar, each Ar is independently a monocyclic or polycyclic Caromatic group, each X is independently —OR, —SR, or —NRR, m is an integer of 1 to 6, each n is independently an integer of 0 to 5, provided that a sum of all n is 2 or greater, and Rto Rare as provided herein.

Adhesion promoting photoresist underlayer composition

An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic Caromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R, R; Rand Rare as provided herein; optionally, Rand Rcan be taken together form a 5- to 7-membered ring; optionally, one of Rto Rcan be taken together with Rto form a 5- to 7-membered ring; wherein Rand Roptionally may be taken together to form a 5- to 7-membered ring; wherein one of Ror Roptionally may be taken together with Rto form a 5- to 7-membered ring; and when X is O, Rand Rare absent.

Underlayer compositions and patterning methods

A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

Photoresist compositions and pattern formation methods

A photoresist composition comprising a polymer, a photoacid generator, an additive comprising a tertiary carbon atom as a ring-forming atom of a lactone ring, and a solvent.

A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and Mare the same as described in the specification.

Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and Mis an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

Coating compositions comprise: a curable compound comprising: a core chosen from a Ccarbocyclic aromatic ring, a Cheterocyclic aromatic ring, a Cfused carbocyclic aromatic ring system, a Cfused heterocyclic aromatic ring system, Caliphatic, and Ccycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.

Coating compositions and methods of forming electronic devices

New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.

Monomers, polymers and lithographic compositions comprising same

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

Salts and photoresists comprising same

A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Zis an organic anion; Aris substituted or unsubstituted Cheteroaryl group comprising a furan heterocycle; and Ris substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Arand Rare optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Aror substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through Ror substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Zas a pendant group to a polymer; and a solvent.

Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from Ccarbocyclic aromatic, Cheterocyclic aromatic, Caliphatic, Cheteroaliphatic, Ccycloaliphatic, and Cheterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core: wherein: Aris an aromatic group independently chosen from Ccarbocyclic aromatic and Cheteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR, protected hydroxyl, carboxyl, protected carboxyl, SR, protected thiol, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;Calkyl, halogen, and NHR; wherein each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, and Caryl; each Ris independently chosen from H, Calkyl, Cunsaturated hydrocarbyl, Caryl, C(&#x2550;O)&#x2014;R, and S(&#x2550;O)&#x2014;R; x is an integer from 1 to the total number of available aromatic ring atoms in Ar; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.

Silicon-containing underlayers

Growing community of inventors

Brookline, MA, United States of America

James F Cameron