Air Products and Chemicals, Inc.

Applied Materials, Inc.

James Edward Mac Dougall

Charles G Coe

Thomas Albert Braymer

Scott Jeffrey Weigel

Alexandros T Demos

Timothy Weidman

Robert Parkash Mandal

Thomas R Gaffney

Nikolaos Bekiaris

Brian Keith Peterson

Michael P Nault

Hareesh Thridandam

Lee Arthur Senecal

A process for depositing porous silicon oxide-based films using a sol-gel approach utilizing a precursor solution formulation which includes a purified nonionic surfactant and an additive among other components, where the additive is either an ionic additive or an amine additive which forms an ionic ammonium type salt in the acidic precursor solution. Using this precursor solution formulation enables formation of a film having a dielectric constant less than 2.5, appropriate mechanical properties, and minimal levels of alkali metal impurities. In one embodiment, this is achieved by purifying the surfactant and adding ionic or amine additives such as tetraalkylammonium salts and amines to the stock precursor solution.

Ionic additives for extreme low dielectric constant chemical formulations

A composition of matter represented by the formula

Zincoaluminosilicates of the FAU structure

A faujasite aluminosilicate with a Si/Al ratio in the range of 1.05 to 1.26 having an non-uniform aluminum distribution, synthesized by crystallizing the zeolite from a mixture of alkali metal aluminate and alkali metal silicate wherein the mixture has an alkali metal oxide to silica ratio of at least 1.6 and a water to alkali metal oxide ratio of at least 37. The X-zeolite has utility as a gas separation adsorbent such as separating oxygen from nitrogen in air.

Faujasite adsorbents with nonuniform Al distribution

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New Tripoli, PA, United States of America

James Edward Mac Dougall