International Business Machines Corporation

Lexmark International, Inc.

James Economy

Anagnostis E Zachariades

John R Susko

Mary Ann Flandera

Willi Volksen

Roger J Clark

Robin A Wheater

Mary A Flandera

Thomas H Baum

Phillip Joe Brock

Carl Eric Larson

Robert L Jackson

Hiroyuki Hiraoka

Jeffrey W Labadie

Do Yeung Yoon

James L Hedrick, Jr

Cheng-Yih Liu

Christopher R Moylan

Lester A Pederson

Richard D Balanson

Augustus C Ouano

Thor L Smith

James R Lyerla, Jr

Roy J Gritter

James R Lyerla

Samuel J Huang

James A Carothers

Wheater, Robin A

Hot roll fusers are made with a matrix resin which is an elastomer having a glass transition between 90.degree. C. and 160.degree. C. and a structure represented by the formula X--Ar--Y--Ar--X wherein Ar is an aromatic ring structure, Y is O, S, C.dbd.O, SO.sub.2, C(CH.sub.3).sub.2, C(CF.sub.3).sub.2, CH.sub.2 or (CF.sub.2).sub.n and X is --O--C.tbd.N, --C.tbd.CH or ##STR1##

Hot roll fusers comprising polyarylene elastomers

Integrated circuit module wherein the cap is sealed to the substrate with a liquid crystalline polyester melt containing about 25 to about 100 mole percent of recurring Units I and O to about 75 mole percent of recurring Units II wherein ##STR1## wherein each R and R.sub.2 is arylene or cycloalkylene or alkylene or alkylidene.

Sealant for integrated circuit modules, polyester suitable therefor and

A process for generating a capacitive servo pattern on a magnetic storage disk, comprising the steps of: (1) coating the disk with a solution of noble metal compound to form a film of the compound on the disk, (2) exposing said film to radiation through a mask to generate an image on the film, and (3) plating the disk on the areas exposed to radiation.

Generation of capacitive servo patterns on magnetic storage disks

An electronic circuit having an electrically conductive pattern formed on a substrate and having on at least one surface of the substrate a film obtained from a soluble polymerizable oligomer of the formula: ##STR1## wherein D is ##STR2## wherein M is --C.tbd.C--, --C.tbd.C--C.tbd.C, --O--, ##STR3## wherein R is an alkyl or aromatic group; wherein Ar is an aromatic group; wherein x is an integer greater than two but less than 30, z is either zero or an integer, and y is an integer wtih the sum of y and z equal to x; and wherein n is an integer from 1 to 10. The substrate is coated by applying the above composition to the substrate and then hardening the composition by further polymerization. Preferred compositions contain the above described oligomer and certain plasticizers and/or toughening agents.

Composition, coated article and method of coating

A process for making a polymer with ultra-high mechanical properties by subjecting to compression and rotation in a contained geometry at a viscosity in the range of from 50 to 10.sup.4 poise an aromatic liquid crystalline copolyester.

Rotational compression process for forming liquid crystalline polymers

An electronic circuit having an electrically conductive pattern formed on a substrate and having on at least one surface of the substrate a film obtained from a soluble polymerizable oligomer of the formula: ##STR1## wherein M is --C.tbd.C--, --C.tbd.C--C.tbd.C, --O--, ##STR2## wherein R is an alkyl or aromatic group; wherein Ar is an aromatic group; wherein X is an integer greater than two but less than 30, z is either zero or an integer, and y is an integer with the sum of y and z equal to x; and wherein n is an integer from 1 to 10. The substrate is coated by applying the above composition to the substrate and then hardening the composition by further polymerization. Preferred compositions contain the above described oligomer and certain plasticizers and/or toughening agents.

Method for providing a top seal coating on a substrate containing an

A method for modifying the surface properties of a material which applies a deformational force which exceeds the elastic limit of the material at the surface so that a plastic deformation of the surface occurs without modifying the bulk properties of the material.

Surface finishing process

A process for producing an extremely smooth or planarized layer of material employs a polymeric material which, when melted has a viscosity enabling it to flow into all crevices and voids on the treated surface. Subsequent heating cures the polymer to form a planarized layer.

Planarization method

A method for improving the durability, surface finish, and magnetic properties of a magnetic recording disk, the recording disk having a magnetic coating material with load bearing particles therein, by applying thereto a deformational force which exceeds the elastic limit of the coating material.

Process for finishing surfaces achieving improved magnetic disk

A process for coating a substrate to provide good planarization and good mechanical and thermal stability, the process comprising applying to the substrate an amino-terminated oligomer and an ester, with the oligomer being formed from an aromatic diamine and from an aromatic dianhydride, and the ester being formed from an aromatic tetracarboxylic acid and an alcohol, and by reacting said oligomer and said ester in situ, with the process being characterized in that the ester reacts with an amine group of the oligomer to form a high molecular weight polyamide at a temperature between 40.degree. C. and 140.degree. C., and continues to react to form a cyclic imide.

Process for coating a substrate with polyimide

The sensitivity of a positive working electron beam resist is increased by using as the resist material a resin which is a condensation product of formaldehyde with a phenol or a cresol having a chloro substituent ortho to the hydroxyl group on its aromatic ring.

Positive electron beam resists of ortho chloro substituted phenol or

The present invention is concerned with enhancement of resist development. In particular it is concerned with obtaining high solubility rate ratio between the exposed and the unexposed regions of a resist and also obtaining shorter development time. These objectives are achieved by treating the resist with a liquid trialkylamine having from two to eight carbon atoms in each alkyl group.

Enhancement of resist development

The resistance of a resist of plasma etching is enhanced by first cross-linking the resist and then contacting it with an aqueous solution of NaOH or KOH. The process is useful to form microcircuits having increased density of geometry.

Process for forming microcircuits

Soluble, polymerizable oligomers having a number average molecular weight of from about 200 to about 10,000, are obtained by treating triethynylbenzene with an oxygen-carrying, amine-basic cupric salt complex catalyst in the presence of a molar excess over the monomer of an aromatic monacetylenic capping agent. The oligomers are used to form polymers which are adhesives and coatings.

Polymerizable acetylenic oligomers

Organic prepolymer fillers capable of curing and reacting chemically with elastomers to form covalent bonds therewith are mixed with elastomers to form reinforcing domains with diameters of from 0.01 to about 50 microns, and when the mixture is cured, the mechanical strength of the elastomer is increased. In many cases, the thermal stability and/or the hydrolytic stability will also be increased.

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San Jose, CA, United States of America

James Economy