USA As Represented by Secretary of the Navy

James David Ingalls

Adam Duncan

Matthew Gadlage

Matthew J Kay

Andrew Mark Howard

Austin H Roach

A method of improving radiation tolerance of floating gate memories is provided herein. Floating gate memories can include a floating gate transistor or a block of floating gate transistors. A floating gate transistor can include a semiconductor region, a source region, a drain region, a floating gate region, a tunnel oxide region, an oxide-nitride-oxide region, and a control gate region. A floating gate transistor or block of floating gate transistors can be written to multiple times in order to accumulate charge on one or more floating gate regions in accordance with an embodiment of the invention. When exposed to radiation, a floating gate region can retain its charge above a certain voltage threshold. A block of floating gate transistors can communicate with an external device where the external device can read a state of the block of floating gate transistors in accordance with an embodiment of the invention.

Method and system for improving the radiation tolerance of floating gate memories

An irreproducible and re-emergent unique structure or pattern identifier manufacturing and detection method, system, and apparatus is provided. A non-volatile floating gate charge storage device can include a block of floating gate transistors that can include a semiconductor region, a source region, a drain region, a floating gate region, a tunnel oxide region, an oxide-nitrite-oxide region, and a control gate region. A structure altering stress effect is applied to the block of transistors to create a passage region in a random number of floating gate regions of floating gate transistors which changes charge storage or electrical characteristics of random elements of the block of transistors. The passage region alters charges on a floating gate region to escape in a different manner than pre-alteration form causing the floating gate region to lose its charge. An apparatus for recording and detecting such differences in pre and post alteration can also be provided.

Irreproducible and re-emergent unique structure or pattern identifier manufacturing and detection method, system, and apparatus

Apparatuses and methods are provided using a plurality of interrupted IC operations to detect various conditions or changes of interest to integrated circuit (IC) elements (e.g., memory cells of NAND Flash memories or floating gate transistor) such as program/erase stress, total ionizing dose, and heavy ion exposure which modify normal IC element bit state changes. An exemplary method can include controlling a plurality of selected IC elements to execute a series of PROGRAM or ERASE operations on all of the plurality of selected elements that are each interrupted or halted before a normal or first time period required for the PROGRAM or ERASE operation has elapsed. An exemplary system records a number of interrupted operations required to cause a state change in each of the plurality of selected IC elements. Embodiments of the invention enable detection of stresses far below at least some thresholds for IC element or bit cell failure.

Methods and apparatuses including one or more interrupted integrated circuit operations for characterizing radiation effects in integrated circuits

An irreproducible and re-emergent unique structure or pattern identifier manufacturing and detection method, system, and apparatus are provided. A non-volatile floating gate charge storage device can include a block of floating gate transistors that can include a semiconductor region, a source region, a drain region, a floating gate region, a tunnel oxide region, an oxide-nitrite-oxide region, and a control gate region. A structure altering stress effect is applied to the block of transistors to create a passage region in a random number of floating gate regions of floating gate transistors which changes charge storage or electrical characteristics of random elements of the block of transistors. The passage region alters charges on a floating gate region to escape in a different manner than pre-alteration form causing the floating gate region to lose its charge. An apparatus for recording and detecting such differences in pre and post alteration can also be provided.

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Bedford, IN, United States of America

James David Ingalls