Memc Electronic Materials, Inc.

James C Lenk

Larry W Shive

Gordon P Hampton

James P Davidson

Gary L Anderson

Philip R Schmidt

Andrew P Lunday

Craig Spohr

Leslie G Stanton

Yoshio Iwamoto

A method for calibrating a semiconductor wafer drying apparatus including a heater and a vessel containing a solvent and capable of receiving semiconductor wafers comprises selecting a test heater temperature and a test processing time. A first set of wafers is placed in the vessel and the heater is operated at the test heater temperature so that a solvent vapor cloud is created in the vessel. The first set of wafers is monitored for substantial envelopment by the vapor cloud during the test processing time. Based on the monitoring step, at least one of the test heater temperature and the test processing time is adjusted to establish at least one operating parameter of an operating heater temperature parameter and an operating processing time parameter for processing successive sets of wafers so as to promote substantial vapor cloud envelopment of each set of wafers dried in the drying apparatus.

Method of calibrating a semiconductor wafer drying apparatus

A box handling apparatus having particular application in the packaging of semiconductor wafers, includes a box opening assembly which can unlatch a lid from a bottom of the box and separate the lid from the bottom. Arms can grip an article, such as a wafer cassette, in the bottom of the box and lift it out. The cassette can be loaded, or wafers already in the cassette unloaded. The apparatus can replace the loaded cassette in the bottom of the box and latchingly re-engage the lid.

Box handling apparatus and method

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O'Fallon, MO, United States of America

James C Lenk