Advanced Ion Technology, Inc.

Other

Medical University of South Carolina

Westinghouse Savannah River Company

Apache Corporation

Dk Engineering Consulting LLC

Polametrics, Inc.

James A Ritter

Yuri Maishev

Leonid Velikov

Alexander Shkolnik

Armin D Ebner

Charles E Holland

Yuri Terentiev

Andrey Shalapenok

Dimitri Velikov

Ihar Hurevich

Ragaiy Zidan

Ray Marvin Alden

Jason G S Ho

Tao Wang

Leonid Velikuv

Yuedan Dong

Jun Wang

Junming Dong

Jason Gs Ho

The current disclosure provides systems and methods for multiple beds undergoing a feed step at the same time with the same feed flow rate and multiple beds undergoing a light reflux step at the same time with the same light reflux flow rate to process a gas stream in a multi-bed, multi-unit vacuum swing adsorption (VSA) process using reasonably sized beds.

Extremely large pressure swing adsorption processes for flue gas treatment

Methods and systems for capture of COfrom a hydrated gaseous stream are described. Systems can be utilized for direct air capture of COand incorporate a low energy temperature-vacuum swing adsorption (TVSA) process. A TVSA process can include a multi-step COcapture bed regeneration process that includes depressurization of the bed, heating of the bed, venting and purging of the bed, and cooling of the bed. Multiple beds can be cycled between COcapture and regeneration, during which captured COis recovered. Off-gas from a COcapture bed can be used in regenerating a parallel bed for increased efficiency.

Temperature-vacuum swing adsorption process for capture of CO2

Methods and systems for removing water vapor from a feed gas prior to further processing the feed gas according to a downstream PSA process are described. The feed gas can include COand/or CO and/or Hand the PSA process can be used to separate components of the feed gas from one another, for instance, for COcapture. Light product off of the PSA process is utilized to regenerate desiccant of a dryer used in the water vapor removal process that is carried out prior to the feed gas entering the PSA process. The water vapor removal process can be heated by providing thermal energy directly to the dryer and/or to a regenerating stream that regenerates the desiccant of the dryer. The thermal energy can be low cost energy&#x2014;for instance, waste heat off of a system that provides the feed gas.

Removal of water vapor from streams containing carbon dioxide and/or carbon monoxide

Disclosed is a method for recovering a volatile organic compound (VOC) using pressure swing adsorption carried out with two beds that includes feeding the VOC to the first bed for adsorption and, while the VOC is being adsorbed by the adsorbent material in the first bed, simultaneously extracting the VOC adsorbed by the adsorbent material in the second bed through executing a desorption step by reducing the pressure of the second bed to cause desorption of the VOC in the adsorbent material of the second bed, executing a reflux step by transferring gas to the second bed and removing the transferred gas from the second bed, and executing a repressurization step by increasing pressure of the second bed to a pressure suitable for adsorption of the VOC by the adsorbent material in the second bed.

Method and system for pressure swing adsorption

A pressure swing adsorption (PSA) system and a PSA process including a PSA cycle schedule are disclosed. The PSA cycle schedule includes an unlimited number of equalization steps, no idle steps, no dead time and a minimum number of three PSA adsorbent beds assisted with two or more equalization tanks. The PSA system, process and cycle schedule include the following sequence of cycle steps: a feed step, two or more down equalization steps either between beds or between a bed and a tank, an optional forced cocurrent depressurization step coupled with a forced intermediary light end pressurization step, a countercurrent depressurization step, a light reflux step, two or more up equalization steps between beds or between a bed and a tank, an optional forced intermediary light end pressurization step coupled with the forced cocurrent depressurization step, and a light product pressurization step.

Pressure swing adsorption process for enhanced separation of lighter from heavier species

The invention described herein enables a variety of heating, cooling, energy transformation, and energy storage options with a small number or components. Described are Pressure Swing Adsorption and Pressure Swing Desorption cycles, processes, and apparatuses including multiple sorption beds and active energy input by a pump and energy storage as pressure differentials. A preferred embodiment includes two zeolite 13X sorption beds, CO2 adsorbate, solenoid valves, and a compressor pump. In operation these components provide a range of heating, cooling, and energy storage options. Operational cycles are described.

Pressure swing adsorption / desorption heating, cooling, and energy storage process and apparatus

In accordance with the present disclosure, a process for synthesis of a complex hydride material for hydrogen storage is provided. The process includes mixing a borohydride with at least one additive agent and at least one catalyst and heating the mixture at a temperature of less than about 600&#xb0; C. and a pressure of Hgas to form a complex hydride material. The complex hydride material comprises MAlBH, wherein M is an alkali metal or group IIA metal, Al is the element aluminum, x is any number from 0 to 1, B is the element boron, y is a number from 0 to 13, and z is a number from 4 to 57 with the additive agent and catalyst still being present. The complex hydride material is capable of cyclic dehydrogenation and rehydrogenation and has a hydrogen capacity of at least about 4 weight percent.

Reversible hydrogen storage materials

A hydrogen storage material having improved hydrogen absorbtion and desorption kinetics is provided by adding graphite to a complex hydride such as a metal-doped alanate, i.e., NaAlH. The incorporation of graphite into the complex hydride significantly enhances the rate of hydrogen absorbtion and desorption and lowers the desorption temperature needed to release stored hydrogen.

Hydrogen storage material and process using graphite additive with metal-doped complex hydrides

An optical system comprising a first array of individual beam shaping elements and a second array of beam shaping elements placed between a light source, e.g., a linear array of individual laser diodes and a reshaped beam receiver, e.g., an optical fiber cable. The inhomogeneous beams emitted from the laser diodes are passed in sequence through the first and second stages so that the first stage reshaped the cross section of the beam, e.g., in the fast-axis direction and the second stage reshapes the cross section of the beam, e.g., in the slow-axis direction. As a result, the output beams of the system may have a cross section reshaped to any desired configuration, e.g., suitable for inputting into the optical fiber cable and having divergences individually adjusted in mutually perpendicular directions.

Optical beam shaper and method for spatial redistribution of inhomogeneous beam

A multiple-cell plasma source consists of a pair of perforated plate-like cathodes and a perforated plate-like anode between the both cathode plates. Perforations in all three plates are coaxial and form a plurality of cells in which a Penning discharge plasma is generated due to the passage of axial components of the magnetic field through the individual cells. Since in all cells the plasma flow components are generated and work independently, there are no limitations for an increase in the surface area of the upper cathode plate, which has plasma emitting holes, so that the plasma source can treat objects of a large surface area. The plasma source of the invention has various means for controlling and adjusting the plasma pattern, distribution, parameters, and shape.

Multiple-cell source of uniform plasma

A cold-cathode type ion-beam source with a closed-loop ion-emitting slit and electrons drifting in crosses electric and magnetic fields is characterized by the absence of a metal anode which is replaced by a pair of positively charged bodies, such as concentric rings of a conductive material which are located inside a hollow housing of the ion source and are connected to a source of a positive potential. The ion-emitting slit is located between these rings in an upstream position in the direction of propagation of the ion beam. Replacement of a metallic anode with an anodic plasma, i.e., with a &ldquo;virtual anode&rdquo;, which is formed by a Penning-type discharge, descreases contamination of the ion beam by products of erosion of a metallic anode and increases the ion beam current, which results in more effective ionization of the workout gas.

Ion-beam source with virtual anode

The invention provides a multiple-cell ion-beam source in which magnetic poles of all adjacent cells have alternating polarities, i.e., the cells arranged in a single row from the center to the periphery of the cathode plate have polarities in the order of N-S-N-S-N . . . , etc. As a result, the direction of magnetic lines of forces in the aforementioned rows alternates, and therefore the magnetic flux is not accumulated towards the center. This means that the source of such a construction does not have dimensional limitations and ensures uniform distribution of the ion-beam current density over the entire surface of the object. Intensity of the magnetic field for each individual cell can be controlled individually. This allows adjustment in the distribution of the ion-beam current density over the surface of the object.

Ion-beam source with uniform distribution of ion-current density on the surface of an object being treated

The invention provides a sputtering system which consists of an ion beam and a target of a sputterable material. A distinguishing feature of the system of the invention is that the sputtering target forms a guide channel for an ion beam and sputtered particles, so that a portion of the ions collides with the walls of the target inside a closed volume of the target and forms neutral sputterable particles impinging the object. The other part of the ions goes directly to the object and participates in an ion-assisted overcoating. Thus, the special form of the target improves efficiency of sputtering, prevents scattering and the loss of the sputterable material. The system can be realized in various embodiments. One of the embodiments provides a multiple-cell system in which each cell has an individual ion-emitting slit formed by the end of a cathode rod of one cathode plate and the opening in the second cathode plate. Tubular or plate-like channeling targets are connected to the ion slits without any gaps in the form of a geometrical extensions of the individual ion-emitting slits. Another embodiment allows adjustment in the position of the rods with respect to the targets.

Ion-beam source with channeling sputterable targets and a method for channeled sputtering

A multiple-beam ion-beam assembly consisting of two or more concentrically arranged ring-shaped ion-beam sources having ion-beam slits that emit a plurality of ion beams which overlap on the surface being treated and thus ensure uniformity in distribution of ion currents on the treated surface. Since the ion-beam assembly consists of a plurality of individual source, uniform treatment can be performed on a large surface area. Several embodiments of the invention cover the systems with individual sources adjustable with respect to one another, with an oblique angle of incidence of beams emitted from individual source, and with combination of oblique angles and adjustable sources.

Multiple-beam ion-beam assembly

A combined ion-source and sputtering magnetron apparatus of the invention comprises a vacuum working chamber that contains a sputtering magnetron, an object to be treated fixed inside the housing of the chamber, and an ion-beam source installed within the working chamber between the object and the sputtering magnetron. In a preferred embodiment, the ion source is a cold-cathode ion source with a closed loop ion-emitting slit and drift of electrons in crossed electric and magnetic fields. The ion source emits the ion beam in the radial inward or outward direction onto the surface of the magnetron target at an oblique angle to the target surface. The bombardment of the target surface with the ion beam generates a large amount of sputtered particles. In addition, the ion bombardment forms a large amount of secondary electrons which are accelerated in the direction away from the target and are held in the crossed electric and magnetic fields of the magnetron target. These electrons ionize molecules of a working gas and forms a plasma. Ions are extracted from the plasma towards the target and sputter its material. This process is maintained in a steady mode. The apparatus is shown in various embodiments including a conveyor treatment.

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Gilbert, SC, United States of America

James A Ritter