International Business Machines Corporation

James A Jubinsky

John Anthony Fitzsimmons

Roy Arthur Carruthers

Paul J Tsang

Geraldine C Schwartz

Fernand J Dorleans

Gerald R Larsen

Richard Flitsch

Robert W Zielinski

Wayne Martin Moreau

Christopher F Lyons

Steven M Katz

A SiCr microfuse, deletable either by electrical voltage pulses or by laser pulses, for rerouting the various components in an integrated circuit, as where redundancy in array structures is implemented, and the method of fabricating same, at any wiring level of the chip, by utilizing a direct resist masking of the SiCr fuse layer to eliminate problems of mask damage and residual metal adjacent the fuse.

Structure and fabrication of SiCr microfuses

SiCr microfuses

A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.

Resists with enhanced sensitivity and contrast

Growing community of inventors

Clinton Corners, NY, United States of America

James A Jubinsky