Koninklijke Philips Corporation N.v.

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Jakob Willi Neff

Jeroen Jonkers

Ralf Pruemmer

Michael Loeken

Peter Zink

Dominik Marcel Vaudrevange

Sven Probst

Harald Ernest Verbraak

Felix A Kuepper

Juergen Klein

The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma () is ignited in a gaseous medium between at least two electrodes (), wherein said gaseous medium is produced at least partly from a liquid material () which is applied to a surface moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device the pulses () of said pulsed energy beams are directed to at least two different lateral locations with respect to a moving direction of said surface. With this measure, the radiation emission volume is expanded, less sensitive to spatial fluctuations and can be adapted better to the requirements of optical systems of any applications. Furthermore, the optical output power can be increased by this measure.

Method and device for generating EUV radiation or soft X-rays

The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma () is ignited in a gaseous medium between at least two electrodes (), wherein said gaseous medium is produced at least partly from a liquid material () which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beams. In the proposed method and device at least two consecutive pulses () are applied within a time interval of each electrical discharge onto said surface(s). With this measure, the collectable conversion efficiency is increased compared to the use of only one single energy pulse within each electrical discharge.

Method and device for generating EUV radiation or soft X-rays with enhanced efficiency

The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (), of which a first electrode body () comprises a rotatably mounted electrode disk (). The source further comprises a rotary drive () for the electrode disk, a device for applying a liquid film of a target material () onto a radial outer surface of the electrode disk (), and a laser that is focussed, within a discharge area (), onto the radial outer surface of the electrode disk () to evaporate target material. The source is characterized by an intermediate space () is formed between the electrode bodies, which intermediate space has a reduced width of &#x3c;5 mm outside the discharge area (), which is smaller than the intermediate space in the discharge area. The source enables the generated radiation to be emitted in a simple manner through a larger solid angle, without being shadowed by the electrodes.

Gas discharge source for generating EUV-radiation

The present invention relates to a method of operating an electrical discharge device () comprising at least one first electrode () and at least one second electrode () at a distance therefrom, which electrodes are electrically connected to a power supply () and, upon ignition of a first gas discharge () between the electrodes (), transmit an electrical current (I), as a result of which a plasma () is produced in a working gas (), which plasma emits radiation (), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle () into a chamber () outside the electrodes (). In order to prevent erosion at the electrodes (), it is proposed that the formation of a secondary plasma () in the chamber () is suppressed by a device ().

Method and apparatus for operating an electrical discharge device

The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma () in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts () driven to transport the metal to said gap, wherein for each of the electrodes a shaper element () is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device () is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.

EUV plasma discharge lamp with conveyor belt electrodes

A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.

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Kelmis, Belgium

Jakob Willi Neff