Az Electronic Materials USA Corp.

Jainhui Shan

Hengpeng Wu

Mark O Neisser

Joseph E Oberlander

Shuji Sue Ding-Lee

Zhong Xiang

Eleazar B Gonzalez

The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R, R' and R&#x2033; are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, &#x2014;O(CO)Z, &#x2014;C(CF)Z, &#x2014;C(CF)(CO)OZ, &#x2014;SOCF, &#x2014;(CO)OZ, &#x2014;SOZ, &#x2014;COZ, &#x2014;OZ, &#x2014;NZ, &#x2014;SZ, &#x2014;SOZ, &#x2014;NHCOZ, &#x2014;NZCOZ or &#x2014;SONZ, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1&#x2013;4, X is O, CO, S, COO, CHO, CHCOO, SO, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0&#x2013;3.

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Pennington, NJ, United States of America

Jainhui Shan