Globalfoundries Inc.

Advanced Micro Devices Corporation

Jaime Bravo

Michael Zhouying Su

Frank G Kuechenmeister

Vikrant Kumar Chauhan

Zhen Zhang

Jun Zhai

Lei Fu

Uwe Paul Schroeder

Piyush Pathak

Shobhit Malik

Ryan Scott Smith

Ranjit Gannamani

Kevin W Lim

Frank Kuechenmeister

Methodologies and a device for assessing integrated circuit and pattern for yield risk based on 3D simulation of semiconductor patterns are provided. Embodiments include generating, with a processor, a 3D simulation of semiconductor patterns; obtaining critical dimensions of distances between layers or within a layer of the 3D simulation of semiconductor patterns; comparing the set of critical dimensions with predefined minimum dimensions; and yield scoring each of the semiconductor patterns of the 3D simulation based on the comparing step.

Three-dimensional pattern risk scoring

Three reference resistors of the same resistance and a test structure are connected in a circuit having a Wheatstone Bride design. The circuit is electrically coupled between an input and ground. A voltage applied at the input resulting in an electrical characteristic difference between two midpoints of the circuit indicates the need for corrective action with respect to a design of the test structure for either OPC or etch bias.

Wafer level electrical test for optical proximity correction and/or etch bias

Methods are provided for packaging a semiconductor die having a first surface. In accordance with an exemplary embodiment, a method comprises the steps of forming a trench in the first surface of the die, electrically and physically coupling the die to a packaging substrate, forming a sealant layer on the first surface of the die, forming an engagement structure within the trench, and infusing underfill between the sealant layer and the engagement structure and the packaging substrate.

Semiconductor device having a filled trench structure and methods for fabricating the same

Various semiconductor chip reinforcement structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes providing a semiconductor chip that has a side and forming a polymer layer on the side. The polymer layer has a central portion and a first frame portion spatially separated from the central portion to define a first channel. An underfill material may be provided to invade the channel and establish a mechanical joint between the polymer layer and the underfill material.

Semiconductor chip with reinforcement layer and method of making the same

Various semiconductor chip crack stops and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes providing a semiconductor substrate that has a first corner defined by a first edge and a second edge. A crack stop is formed in the semiconductor substrate. The crack stop includes a first projection extending to the first edge and a second projection extending to the second edge to fence off a portion of the semiconductor substrate that includes the first corner.

Semiconductor chip with crack stop

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Santiago, Chile

Jaime Bravo