Boe Technology Group Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Jaeyun Jung

Shikai Wang

Dongseob Kim

Dengtao Li

Yadong Liang

Jun Geng

Liangliang Li

Zhi Hou

Mingming Wang

Huadong Wang

Jaemoon Chung

Daeyoung Choi

Yubao Zi

Yadong Xu

Qianqian Li

Shengrong Li

Shiwei Lv

Dalin Xu

Keunbum Lee

Fugang Zhang

Daiwu Wu

Xuanqi Liang

The present disclosure provides a wet etching machine and an etching method. The wet etching machine including an etching chamber in which at least two etching layers are disposed. The etching layers are successively overlapped with each other from up to down, and each etching layer includes a first transfer carrier for receiving and transferring a substrate to be etched and a spraying apparatus disposed right above the first transfer carrier for spraying etching solution. When the total etching time is needed to be longer than the transfer time of the substrate without stopping the substrate, the present disclosure can solve the problems in the prior art of causing the takt time decreased due to the stopping time of the substrate is required to be increased or causing the area of the facility increased due to the number of the etching chambers connected in series is required to be increased.

Wet etching machine and etching method using the same

A liquid knife cleaning device is provided, and it includes a splash shield; a liquid knife, which is located under the splash shield; an oblique baffle, which is located between the splash shield and the liquid knife, and a lower side of which is fixedly bonded to the top of a blade of the liquid knife. The oblique baffle can act to isolate the liquid knife and the substrate on the delivery roll from a majority of water vapor, and droplets dripping on the oblique baffle can flow down along a slope of the oblique baffle, and will not drip on the substrate that has not been rinsed by the liquid knife. Effects of droplets on the uniformity of the substrate can be greatly reduced by the present technique, thereby enhancing the product quality.

Liquid knife cleaning device

The present disclosure relates to the technical field of glass substrate cleaning. Specifically, the present disclosure provides a glass substrate detergent tank which can solve the technical problem of wasting detergent solution. The detergent tank includes a tank body enclosed by a top face, a bottom face and side faces. There are a water inlet, a water outlet and a vent hole in tank body. There is a partition plate disposed between two facing inside faces of the tank body, which separate the tank body into two cavities communicating at the bottom. The detergent tank according to the embodiment of the present disclosure will not let froth discharge outside the tank body with gas, and thus can reduce the amount of wasted detergent solution, thereby extending the usage time of the detergent solution.

Glass substrate detergent tank and cleaning device

The present invention provides an array substrate, a method for manufacturing the same and a display device, and relates to technical field of displays. The method for manufacturing an array substrate comprises forming a metal layer on a substrate and removing superficial metallic oxide on the metal layer by a washing process. The method for manufacturing an array substrate according to the present inversion can remove the superficial metal oxide on the metal layer and improve the performance of a TFT.

Array substrate, method for manufacturing the same and display device

The present invention provides a method for manufacturing an array substrate, wherein each data line in a plurality of data line groups forms an integral structure with a first shorting bar, and after etching a source-drain component to form a source electrode and a drain electrode, the data line groups which do not correspond to the first shorting bar is disconnected from the first shorting bar. By adopting the method provided by the present invention, electrostatic breakdown in the manufacturing process of the array substrate can be reduced.

Method for manufacturing array substrate

The embodiment of the invention discloses a liquid crystal display and a method of manufacturing the same. The liquid crystal display of the embodiment of the invention comprises an array substrate, a color filter substrate and a liquid crystal layer formed between the array substrate and the color filter substrate. The array substrate comprises a first substrate; a black matrix formed on the first substrate; and a thin film transistor (TFT) device formed on the black matrix. The TFT device is a top gate TFT device having a gate electrode formed on a side of the TFT device facing away the black matrix and an active layer made of a-Si. The color filter substrate comprises a second substrate; and a color filter layer formed on the second substrate. The color filter substrate does not include a black matrix.

Liquid crystal display device in which array substrate includes black matrix and method of manufacturing the same

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Beijing, China

Jaeyun Jung