Chong Kun Dang Pharmaceutical Corporation

Sungkyunkwan University

Inje University Industry-Academic Cooperation Foundation

JaeWon Lee

NiNa Ha

Jung Taek Oh

JaeKwang Lee

Su Kil Seo

Seokjun Hong

Taesung Kim

Suyeal Bae

SeoHee Lee

HoJin Choi

Sera Lee

SunMi Lee

Sanghyeon Park

ChangGon Lee

Song-Min Lee

Hyeonmin Seo

The present application relates to a method for preparing a polishing slurry, the method including the steps of preparing a solution containing abrasive particles and a fluid, passing the solution through a porous membrane filter region, and preparing a polishing slurry by removing the fluid from the solution that has passed through the region, in which in the step of passing the solution through the region, those with a mean particle size of 100 nm or less among the abrasive particles are removed by a tangential flow filtration method.

Method for preparing polishing slurry and polishing method using same

The present invention relates to novel N-acylhydrazone derivatives, and more particularly to novel N-acylhydrazone derivatives having selective T cell inhibitory activity and/or anti-lymphoid malignancy activity, stereoisomers thereof, pharmaceutically acceptable salts thereof, the use thereof for preparing pharmaceutical compositions, pharmaceutical compositions containing the same, treatment methods using the compositions, and methods for preparing the novel N-acylhydrazone derivatives.

N-acylhydrazone derivatives for selective T cell inhibitor and anti-lymphoid malignancy drug

The present invention relates to cycloalkenyl aryl derivatives, isomers thereof, pharmaceutically acceptable salts thereof, hydrates thereof, or solvates thereof; a method for preparing the derivatives; and pharmaceutical compositions containing the same. The compounds of the present invention show the effect of CETP activity inhibition. It means that the compounds can increase HDL-cholesterol and decrease LDL-cholesterol.

Cycloalkenyl aryl derivatives for CETP inhibitor

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Yongin-si, South Korea

JaeWon Lee