Samsung Electronics Co., Ltd.

Jaesung Kang

Jihyun Lee

Jaewon Choi

Chul-Ho Kim

Yool Kang

Kyunghoon Chung

Yunseok Jang

Jeongwoo Lim

Jinphil Choi

An operational amplifier includes an input stage with a first main input unit, a first auxiliary input unit, a second main input unit and a second auxiliary input unit, an amplification stage with a first current mirror receiving currents from the first main input unit and the first auxiliary input unit, and a second current mirror receiving currents from the second main input unit and the second auxiliary input unit, an output stage receiving voltages from the first current mirror and the second current mirror, a voltage storage unit storing an intermediate voltage based on an output signal generated by the output stage during at least one of a first operation period and a second operation period, and a switching unit that differently controls a first feedback path between the output stage and the input stage and a second feedback path between the output stage to the voltage storage unit in accordance with the first operation period and the second operation period.

Operational amplifier compensating for offset voltage, gamma circuit and source driver including same

A method of forming a mask pattern and a method of fabricating a semiconductor device, the method of forming a mask pattern including providing a substrate including a plurality of patterns thereon; forming a mask material solution layer such that the mask material solution layer covers the patterns on the substrate; and applying a liquid material to remove an upper portion of the mask material solution layer, wherein the mask material solution layer includes a fluorine additive concentrated at the upper portion of the mask material solution layer.

Method of forming mask pattern and method of fabricating semiconductor device using the same

Growing community of inventors

Hwaseong-si, South Korea

Jaesung Kang