Samsung Electronics Co., Ltd.

Hanwha Advanced Materials Corporation

Jaeseok Yang

Taehyung Kim

Jinwoo Jeong

Young-Hun Kim

Jongchan Shin

Moon Gi Cho

Panjae Park

Hyeonuk Kim

Haewang Lee

Eryung Hwang

Ha-Young Kim

Jintae Kim

Raheel Azmat

HyunJae Lee

Jiyoung Jung

Kwanyoung Chun

Chulhong Park

Jong Ik Hwang

Sharma Deepak

In-Wook Oh

Goo Jang

Chunghee Kim

Byeong Chun Lee

Curie Ahn

Jaehyoung Lim

Dae Kee Kwon

Jung Taek Kang

Bum Rae Cho

Rajeev Ranjan

Kuchanuri Subhash

Donggyun Kim

Sungkeun Park

Ok Jae Koo

Daekwon Kang

Younggook Park

Myungsoo Jang

A semiconductor device includes a substrate with a first active region; first and second active patterns extending in a first direction and spaced apart in a second direction, and each having a source pattern, a channel pattern, and a drain pattern that are sequentially stacked; first and second gate electrodes that surround the channel patterns of the first and second active patterns and extend in the first direction; an interlayer dielectric layer that covers the first and second active patterns and the first and second gate electrodes; a first active contact that penetrates the interlayer dielectric layer and is coupled to the first active region between the first and second active patterns; and a first power rail on the interlayer dielectric layer and electrically connected to the first active contact, each of the first and second active patterns including an overlapping region that vertically overlaps the first power rail.

Method of fabricating a semiconductor device

Disclosed are semiconductor devices and methods of fabricating the same. The method comprises sequentially stacking a lower sacrificial layer and an upper sacrificial layer on a substrate, patterning the upper sacrificial layer to form a first upper sacrificial pattern and a second upper sacrificial pattern, forming a first upper spacer and a second upper spacer on sidewalls of the first upper sacrificial pattern and a second upper sacrificial pattern, respectively, using the first and second upper spacers as an etching mask to pattern the lower sacrificial layer to form a plurality of lower sacrificial patterns, forming a plurality of lower spacers on sidewalls of the lower sacrificial patterns, and using the lower spacers as an etching mask to pattern the substrate. The first and second upper spacers are connected to each other.

Semiconductor device and method of fabricating the same

Semiconductor device

A scan flip-flop includes a multiplexer, a first latch, a second latch, an output buffer and a clock buffer. The multiplexer selects one of a data input signal and a scan input signal based on an operation mode. The first latch latches an output of the multiplexer. The second latch latches an output of the first latch. The output buffer generates an output signal based on an output of the second latch. The clock buffer generates a first clock signal and a second clock signal that control operation of the first latch and the second latch. The first latch, the second latch, and the clock buffer are sequentially arranged along a first direction. A first clock line supplying the first clock signal and a second clock line supplying the second clock signal have a cross couple connection.

Scan flip-flop, flip-flop and scan test circuit including the same

Semiconductor devices are provided. A semiconductor device includes a gate structure and an adjacent contact. The semiconductor device includes a connector that is connected to the contact. In some embodiments, the semiconductor device includes a wiring pattern that is connected to the connector. Moreover, in some embodiments, the connector is adjacent a boundary between first and second cells of the semiconductor device.

Semiconductor devices having multi-level metallization structures

Semiconductor devices

A semiconductor device includes a first active pattern extending in a first direction on a first region and a second region of a substrate, a first dummy gate electrode extending in a second direction crossing the first active pattern between the first region and the second region, a contact structure contacting the first dummy gate electrode and extending in the first direction, and a power line disposed on the contact structure and electrically connected to the contact structure. The power line extends in the first direction. The contact structure overlaps with the power line when viewed in a plan view.

Semiconductor device and method of manufacturing semiconductor device

A method of fabricating a semiconductor device includes providing a substrate that includes first and second main regions and a dummy region, and forming dummy active patterns on the dummy region. The first and second main regions are spaced apart from each other in a first direction and the dummy region includes a dummy connection region between the first and second main regions and first and second dummy cell regions spaced apart from each other in a second direction. First dummy active patterns, second dummy active patterns, and connection dummy active patterns connecting some of the first dummy active patterns to some of the second dummy active patterns are provided on the first and second dummy cell regions and the dummy connection region, respectively.

Methods of fabricating a semiconductor device

A method can include separating a design area of a substrate for a semiconductor integrated circuit (IC) into cell blocks, where a distance between adjacent ones of the cell blocks can be greater than or equal to a minimum distance defined by a design rule for the semiconductor integrated circuit to provide separated cell blocks, designing a layout for the semiconductor IC in the separated cell blocks, and individually coloring the layout of each of the separated cell blocks.

Individually coloring separated cell blocks in layout of integrated circuits

Growing community of inventors

Hwaseong-si, South Korea

Jaeseok Yang