Samsung Electronics Co., Ltd.

Lg Electronics Inc.

Yonsei University

Jaeseok Kim

Hoyoung Kim

Boun Yoon

Sanghee Yoo

Daehan Kwon

Youngho Jung

Donghyun Jin

Sangho Cho

Incheol Kang

Bo Kyeong Kang

Kihyuk Kim

Younggeun Roh

Ho Young Kim

Unjeong Kim

Yunpyo Hong

Sangkyun Im

Hyeokjong Lee

Ilyoung Yoon

Hyunyong Choi

Soowon Park

Jaehoo Park

Eunji Park

Seungryong Han

Chang-Sun Hwang

Young Jo Kim

Jaehyun Kwon

Inho Hwang

Changheon Lee

Aram Lee

Hyuntae Lee

Chungil Kim

Kilsoo Jung

Sukhoon Jeong

Jihun Koo

Kwansung Kim

Hyukyeon Lee

Chihun In

Ki Ho Bae

KyungTae Lee

Hyunsub Kim

Yujin Yun

Jonghyun Bae

Junha Im

Juwon Byun

A stack-type laundry treating apparatus includes upper and lower treating apparatuses and aligning legs. The upper treating apparatus includes an upper cabinet including an upper side panel and an upper base panel. The lower treating apparatus includes a lower cabinet including a lower side panel. A top of the lower cabinet is covered with the upper base panel. The aligning legs are interposed between the upper side panel and the lower side panel to space the upper side panel and the lower side panel from each other by a predefined vertical spacing. The upper side panel has a bottom portion vertically and downwardly extending along the predefined vertical spacing.

Stack-type laundry treating apparatus

A laundry treating apparatus incudes a first treating apparatus, a second treating apparatus that is disposed vertically below the first treating apparatus and supports the first treating apparatus, and an insulating portion that connects the first treating apparatus and the second treating apparatus to each other. The first treating apparatus includes a first cabinet that defines an external appearance of the first treating apparatus, and a first drum disposed inside the first cabinet and configured to accommodate laundry therein. The second treating apparatus includes a second cabinet that defines an external appearance of the second treating apparatus, and a second drum disposed inside the second cabinet and configured to accommodate laundry therein. The insulating portion includes an insulating material and electrically insulates the first treating apparatus and the second treating apparatus from each other.

Laundry treating apparatus

A transparent display module includes: a transparent substrate; a line pattern provided on the transparent substrate in a form of a two-dimensional grid; a plurality of micro-pixel integrated circuits (ICs) provided on the line pattern; a plurality of inorganic light emitting elements provided on the line pattern or the plurality of micro-pixel ICs; a plurality of transparent areas formed in areas in which the line pattern is not provided, and at least one pixel circuit configured to supply a driving current to the plurality of inorganic light emitting elements.

Transparent display module and apparatus with micro-pixel packages mounted on transparent substrate

A laundry treatment apparatus in accordance with the present disclosure includes a drum configured to accommodate laundry, an air channel through which air is flowed into or out of the drum, a fan configured to put pressure on air in the air channel for flowing of the air, a fan motor configured to rotate the fan and being controlled by adjusting of a RPM, an abnormal airflow detection unit disposed on the air channel and configured to detect whether an abnormal state of airflow is occurred, and a controller configured to cause the RPM of the fan motor to be increased. The controller configured to cause laundry to be dried by rotating the fan motor at a predetermined base RPM, and to cause the RPM to be increased if the abnormality of airflow is detected by the abnormal airflow detection unit while the fan motor is rotating.

Laundry treatment apparatus and controlling method thereof

An optical sensor is disclosed. The optical sensor may include a substrate, a topological insulator layer formed on the substrate, an oxide layer formed on the topological insulator layer, a graphene layer stacked on the oxide layer, and a dielectric layer covering the graphene layer.

Optical sensor

A laundry treating apparatus comprises a cabinet forming a profile, provided with a laundry opening; a door having an inner frame arranged toward the laundry opening and an outer frame coupled to the inner frame and arranged toward the outside of the cabinet, and opening and closing the laundry opening; a hinge part having a first pivot rotating the door along a first rotational direction and a second pivot rotating the door along a second rotational direction different from the first rotational direction; a pivot switching member movable to rotatably fix the door to any one of the first pivot and the second pivot; and a pressing piece provided in the door and pressed by a user to move the pivot switching member, wherein the pressing piece includes a pressing point pressed by the user, and the pressing point is provided at an upper end of the pressing piece.

Provided are a TSM rate-distortion optimizing method, encoding method and device using the same, and an image processing apparatus. The TSM rate-distortion optimizing method includes calculating a cost of each intra-prediction mode with respect to a block to be encoded using a sum of absolute values of differences between original pixels and reference pixels; selecting candidate modes of the intra-prediction modes according to the cost; calculating a TSM (Transform Skip Mode)-based rate-distortion cost according to the candidate modes; and comparing rate-distortion costs of the candidate modes and deciding a mode to be used for intra-prediction of the block.

TSM rate-distortion optimizing method, encoding method and device using the same, and apparatus for processing picture

A method of manufacturing a semiconductor device includes forming on a substrate gate electrodes extending in a first direction and spaced apart from each other in a second direction, forming capping patterns on the gate electrodes, forming interlayer dielectric layer filling spaces between adjacent gate electrodes, forming a hardmask on the interlayer dielectric layer with an opening selectively exposing second to fourth capping patterns, using the hardmask as an etch mask to form holes in the interlayer dielectric layer between the second and third gate electrodes and between the third and fourth gate electrodes, forming a barrier layer and a conductive layer in the holes, performing a first planarization to expose the hardmask, performing a second planarization to expose a portion of the barrier layer covering the second to fourth capping patterns, and performing a third planarization to completely expose the first to fourth capping patterns.

Methods of manufacturing semiconductor devices

A laundry treating apparatus comprising a cabinet including a laundry introduction port, a door to open and close the introduction port, a hinge unit configuring a first rotating axis and a second rotating axis, the hinge unit including a first shaft and a second shaft configuring the first rotating axis and a third shaft and a fourth shaft configuring the second rotating axis, and a rotating shaft shifting unit that rotatably fastens the door to any one of the first rotating axis and the second rotating axis, the rotating shaft shifting unit including a first shifting unit and a second shifting unit selectively and rotatably fastening the fourth shaft to the cabinet. The fourth shaft includes a protrusion protruding toward the second shifting unit, and a fourth side flat surface is formed on the protrusion and supports the second shifting unit by establishing surface contact with the second shifting unit.

An electronic device and method for signal detection in a wireless communication system is provided. The electronic device includes a receiving unit configured to receive a radio frequency (RF) signal, a control unit configured to process the received signal, wherein processing the received signal comprises canceling a signal corresponding to a first stage in the received signal, detecting a signal corresponding to a second stage by applying lattice reduction, and determining a final detected signal by combining the detected signal corresponding to the second stage with candidates of the signal corresponding to the first stage.

Apparatus and method for signal detection in a wireless communication system

An image interpolation apparatus is provided which includes an edge area distinguishing part configured to distinguish an edge area including an edge from an image; an edge area classifying part configured to classify the edge area into a plurality of regions; and an interpolation part configured to perform interpolation the regions in different manners.

Apparatus and method for interpolating image, and apparatus for processing image using the same

A method of fabricating a semiconductor device includes forming first gate patterns on a semiconductor substrate using an etch mask pattern, forming a trench in the semiconductor substrate between the first gate patterns, forming an insulating layer in the trench, such that the insulating layer fills the trench and is disposed on the etch mask pattern, planarizing the insulating layer until a top surface of the etch mask pattern is exposed, etching a portion of the planarized insulating layer to form a device isolation layer in the trench, forming a second gate layer covering the etch mask pattern and disposed on the device isolation pattern, and planarizing the second gate layer until the top surface of the etch mask pattern is exposed, such that a second gate pattern is formed.

Semiconductor device and method of fabricationg the same

Disclosed is a data transmitting device which includes an input symbol mapping unit converting serial data symbols to parallel data symbols and generating null signals; and a conversion unit converting the parallel data symbols and the null signals to a plurality of subcarriers and a plurality of null subcarriers using sub frequency bands overlapped with one another, wherein the plurality of subcarriers is transformed using sub frequency bands separated from one another.

Data transferring device, data transferring method and data receiving method

Methods are provided for forming gates in gate-last processes. The methods may include performing chemical mechanical polishing (CMP) on an interlayer dielectric (ILD) that is on a plurality of dummy gates, each of the plurality of dummy gates including a gate mask in an upper portion thereof, and the CMP exposing the gate mask. The methods may also include removing the gate mask by etching the gate mask. The methods may further include performing CMP on the ILD.

Methods for forming gates in gate-last processes and gate areas formed by the same

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Seoul, South Korea

Jaeseok Kim