Industry-University Cooperation Foundation Hanyang University

Lg Electronics Inc.

Jaehyung Lim

Hendry Hendry

Joonyoung Park

Yongjoon Jeon

Byeongmoon Jeon

Naeri Park

Seungwook Park

Chulkeun Kim

Jungsun Kim

Ungyu Paik

Hao Cui

Jeagun Park

Jinhyung Park

Jongyoung Cho

Heesub Hwang

Yehwan Kim

The present invention relates to slurry for polishing crystalline phase-change materials and to a method for producing a phase-change device using the same. The slurry for polishing crystalline phase-change materials according to one embodiment of the present invention comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water. In addition, the method for producing a phase-change device according to one embodiment of the present invention comprises the following steps: preparing a substrate; forming a crystalline phase-change material film on the substrate; and removing the phase-change material film through a chemical-mechanical polishing process using slurry for polishing phase-change materials, which comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water.

Slurry for polishing phase-change materials and method for producing a phase-change device using same

Growing community of inventors

Incheon, South Korea

Jaehyung Lim