Lg Chem, Ltd

Korea Advanced Institute of Science and Technology

Shanjin Optoelectronics (suzhou) Co., Ltd.

Jaehong Park

Tae Ho Kim

Hyung Il Yang

Deok Woo Park

Woo Yong Cho

Min Woo Hwang

Jeong Yeun Kim

Dong Hoon Chung

Kyun Il Rah

Byung Sun Lee

Du Jin Choi

Junghwan Hyung

Jeoungwoo Kim

Wangyu Lee

Hoseung Jeon

The present disclosure relates to a mask film used for manufacturing a polarizing plate having a locally bleached area, and a polarizing plate manufactured using the same.

Mask film and method for manufacturing polarizing plate by using same

Disclosed is a polarizing plate including a polarizing film and a protective film provided on the polarizing film, and a display device having the same.

Polarizing plate and display device comprising same

Provided are a polarizing plate including a polarizing film and protective films provided on both sides of the polarizing film and a display device including the same.

The present invention provides a semiconductor device manufacturing method for lowering the technical difficulties of a process forming a horizontal single crystal nanowire and a manufacturing cost, the semiconductor device manufacturing method comprising the steps of: preparing a substrate including a first area and a second area; determining a position at which a nanowire is to be formed on the substrate of the first area and arranging an empty space in which the nanowire is to be filled; exposing a substrate surface of a part adjacent to the first area; causing selective single crystal growth from the exposed substrate surface; and forming a nanowire by a self-aligned method through an etching process within the first area, and removing, from outside the first area, a single crystal growth layer of the remaining areas excluding a part necessary for the wiring of the second area.

Semiconductor device manufacturing method

Growing community of inventors

Daejeon, South Korea

Jaehong Park