Samsung Display Co., Ltd.

Jaebum Pahk

Kyongho Hong

Jeongho Yi

Dokyun Kwon

Gyoowan Han

Cheollae Roh

Toshinaru Suzuki

Jinwon Baek

Jinpyung Lee

Jihun Kang

A substrate processing apparatus includes the following: a support frame, first stage, a suction part, and a plurality of island-type second stages. The support frame is disposed on the first stage. The height of the support frame is lower than the height of the first stage. A plurality of island-type second stages are disposed on the support frame on the same plane as the first stage. The suction part is disposed on the support frame.

Substrate processing apparatus and substrate processing method

A particle removal device includes: a stage on which a target substrate is disposed; an inner case defining a first discharge opening through which the stage is exposed to an internal space of the inner case; an outer case including: a side wall portion surrounding the inner case, a protrusion portion protruded from the side wall portion toward the inner case, and a second discharge opening in fluid connection with the first discharge opening; a suction pump connected to the second discharge opening; an air injector in fluid connection with the internal space; and an intake opening in fluid connection with the first and second discharge openings. A width of the intake opening as a distance between the distal end of the inner case and the distal end of the protrusion portion is smaller than a width of the first discharge opening.

Particle removal apparatus and laser cutting apparatus including the same

A deposition apparatus including a crucible to receive the deposition material and in which a deposition material is evaporated; a linear deposition source having a sprayer to spray the evaporated deposition material; a first connection portion and a second connection portion spaced apart from each other by a predetermined interval, the first connection portion and the second connection portion connecting the linear deposition source to the crucible at an upper surface of the crucible; and a heater in the crucible to apply heat to the deposition material, wherein the upper surface of the crucible has a first convex portion and a second convex portion successively formed between the first connection portion and the second connection portion.

Deposition apparatus

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Seoul, South Korea

Jaebum Pahk