Samsung Sdi Co., Inc.

Jaebum Lim

Sunghwan Kim

Seunghyun Kim

Yushin Park

Sunyoung Yang

Hyeonil Jung

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a compound represented by Chemical Formula 1,  

Hardmask composition, hardmask layer and method of forming patterns

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

Disclosed are a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, an organic layer composition including the polymer, and a method of forming patterns using the organic layer composition.  The Chemical Formulae 1 and 2 are the same as defined in the specification.

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Suwon-si, South Korea

Jaebum Lim