Rohm and Haas Electronic Materials Korea Ltd.

Jae Yun Ahn

Chang-Young Hong

Dong-Yong Kim

Min-Kyung Jang

Jung-June Lee

Eui-Hyun Ryu

Eui Hyun Ryu

Myung Yeol Kim

Hae-Jin Lim

Dong Je Hong

Ohk-Min Jeon

Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.

Overcoat compositions and methods for photolithography

New photobase generators suitable for use in photoresists are provided that correspond to Formula (I):X&#x2014;R&#x2014;O&#x2014;C(&#x2550;O)N(R)R&#x2003;&#x2003;(I)wherein Xis an optionally substituted aromatic group; Ris a linker; and Rand Rare the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of Rand Ris an optionally substituted branched alkyl group having 4 or more carbon atoms.

Photobase generators and photoresist compositions comprising same

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Busan, South Korea

Jae Yun Ahn