Growing community of inventors

Seoul, South Korea

Jae Wan Hong

Average Co-Inventor Count = 2.85

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 5

Jae Wan HongYoung Jin Park (3 patents)Jae Wan HongWon Young Song (3 patents)Jae Wan HongSang Jung Ahn (2 patents)Jae Wan HongJin Ho Choi (2 patents)Jae Wan HongByong Chon Park (2 patents)Jae Wan HongJoon Lyou (2 patents)Jae Wan HongYu Sin Yang (1 patent)Jae Wan HongSang Kil Lee (1 patent)Jae Wan HongChung Sam Jun (1 patent)Jae Wan HongWoon Song (1 patent)Jae Wan HongJeong Hoi Kim (1 patent)Jae Wan HongSeung Hun Baek (1 patent)Jae Wan HongJu Youb Lee (1 patent)Jae Wan HongKi Young Jung (1 patent)Jae Wan HongJae Wan Hong (7 patents)Young Jin ParkYoung Jin Park (88 patents)Won Young SongWon Young Song (3 patents)Sang Jung AhnSang Jung Ahn (7 patents)Jin Ho ChoiJin Ho Choi (6 patents)Byong Chon ParkByong Chon Park (5 patents)Joon LyouJoon Lyou (2 patents)Yu Sin YangYu Sin Yang (8 patents)Sang Kil LeeSang Kil Lee (8 patents)Chung Sam JunChung Sam Jun (6 patents)Woon SongWoon Song (1 patent)Jeong Hoi KimJeong Hoi Kim (1 patent)Seung Hun BaekSeung Hun Baek (1 patent)Ju Youb LeeJu Youb Lee (1 patent)Ki Young JungKi Young Jung (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Nanofocus Inc. (3 from 3 patents)

2. Quad Miners (3 from 3 patents)

3. Korea Research Institute of Standards and Science (2 from 297 patents)

4. Samsung Electronics Co., Ltd. (1 from 131,744 patents)


7 patents:

1. 12231322 - Network forensic system and method

2. 12199853 - Network forensic system and method

3. 11838196 - Network forensic system and method

4. 10222414 - Apparatus and method for exchanging probe

5. 9009861 - Substrate measurement apparatus with electron distortion unit

6. 8434159 - AFM measuring method and system thereof

7. 8153338 - Apparatus and method for repairing photo mask

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as of
1/5/2026
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