Samsung Electronics Co., Ltd.

Jae-pil Kim

Sun-Tae Jung

Jae-geol Cho

Hang-sik Shin

Kwang-Choon Kim

Hyun-Jae Baek

Tae-ryong Kim

Jin-hong Min

Ka-soon Yim

Jong-sik Won

A physiological signal measurement apparatus includes a battery cover covering an area where a battery of a terminal device is detachably attached, a sensor unit detecting a physiological signal, the sensor unit being included in the battery cover, and a control unit controlling the sensor unit to detect the physiological signal, wherein the physiological signal measurement apparatus is detachably attached to the terminal device as the battery cover is detachably attached to the terminal device.

Method and apparatus for measuring bio signal

An apparatus and method for generating music is provided. A bio-signal measurer measures a bio-signal of a user. A bio-signal configuration information extractor extracts bio-signal configuration information from the measured bio-signal. A music composition information setter matches the extracted bio-signal configuration information to music composition information for composing a music file and sets a result of the matching as set music composition information. A melody composer composes a melody including the set music composition information. A music file generator generates a music file including the composed melody.

Apparatus and method for generating music using bio-signal

A photoresist mask removing method for effectively removing polymers produced as by-products during etching of a metal layer includes processing the polymers prior to removal to facilitate removal thereof. To remove the photoresist mask remaining on a semiconductor substrate after the metal layer is dry-etched in an etching chamber, the semiconductor substrate is preferably conveyed from the etching chamber to an ashing chamber without vacuum break. The semiconductor substrate is pretreated by supplying N,gas into the ashing chamber under the vacuum state without applying RF power to the ashing chamber to blow the N,gas on the semiconductor substrate heated up to a predetermined temperature. This pretreatment modifies the polymer by-products to facilitate removal thereof during ashing. The photoresist mask and the polymer by-products are removed by ashing in the ashing chamber.

Method for removing photoresist mask used for etching of metal layer and other etching by-products

Growing community of inventors

Seongnam-si, South Korea

Jae-pil Kim