Samsung Display Co., Ltd.

Jae Min Hong

Seung Min Jin

Jai Phoong Kim

Chang Uk An

Jong Hyoek Ryu

Provided are a deposition mask cleaning apparatus and a deposition mask cleaning method. The deposition mask cleaning apparatus includes a treated water bath containing treated water in which a deposition mask is immersed; a treated water generation part supplying the treated water to the treated water bath; a treated water supply pipe connecting the treated water bath and the treated water generation part; and a bubble generation part disposed in the treated water supply pipe and generating bubbles in the treated water. The treated water includes at least one of ozone water, hydrogen water, ammonia hydrogen water, and carbonated water. The bubbles include at least one of microbubbles having a bubble diameter of about 50 μm or less and nanobubbles having a bubble diameter of about 1 μm or less.

Deposition mask cleaning apparatus and deposition mask cleaning method

A magnet assembly includes a support plate and a plurality of magnets which are removably fixed to the support plate and applies a magnetic force to a deposition mask. Each magnet among the plurality of magnets include a first surface facing the support plate, a second surface opposite to the first surface and facing the deposition mask, and a magnet groove defined therein.

Growing community of inventors

Seongnam-si, South Korea

Jae Min Hong