Samsung Electronics Co., Ltd.

Jae Jin Shin

Kyunghyun Kim

Yongsun Ko

Kijong Park

Jun-Youl Yang

Taeheon Kim

A plasma etching apparatus includes an etching chamber and at least one processor. The etching chamber is configured to support a target therein. The at least one processor is configured to: determine a process condition for plasma etching the target before execution of a plasma etching process; and control an aspect of the chamber according to the process condition. The process condition includes a unit etching time over which the plasma etching process is to be continuously performed.

Growing community of inventors

Seoul, South Korea

Jae Jin Shin