Samsung Electronics Co., Ltd.

Osong Medical Innovation Foundation, Korea University Research and Business Foundation

Sungkyunkwan University

Fine Semitech Corp.

Jae-Hyuck Choi

Byung-Gook Kim

Hyung-ho Ko

Jong-Keun Oh

Chan-Uk Jeon

Jin-su Kim

Han-Shin Lee

Ho-Young Kim

Kyoung-mi Kim

Won-Jung Kim

Hong-Gyu Park

Jin-sik Jung

Keun-Hwan Park

Jun-Youl Choi

Kyoung-Ho Kim

Tae-Sung Kim

Seong-sue Kim

Dong-gun Lee

Soo-Young Kim

JungMin Lee

Jung-jin Kim

Ji-Beom Yoo

Yong-Seok Jung

Dong-Wook Shin

Mun-Ja Kim

Hwan-Chul Jeon

Jang-dong You

Bum-Hyun An

Sung-won Kwon

Soon-Hong Kwon

Minsoo Hwang

Min-Soo Hwang

Ha-Reem Kim

Soo-Wan Koh

You-Shin No

Sung-wan Kim

Ik-jun Kim

Hae-young Jeong

Soo-jung Kang

You-Sin No

Jaepil So

A photonic crystal device includes a two-dimensional crystal including a gain medium and having a first photonic crystal resonator and a second photonic crystal resonator spaced apart from each other and a graphene layer disposed to cover a portion of the first photonic crystal resonator and not to cover the second photonic crystal resonator.

Photonic crystal device

A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.

Method of detaching a pellicle from a photomask

A photonic crystal laser and a strain measuring device are provided. The photonic crystal laser includes a disk-shaped photonic crystal structure two-dimensionally disposed in a matrix on a disposition plane and a flexible substrate disposed to support the photonic crystal structure and to cover at least a side surface of the photonic crystal structure.

Photonic crystal laser and strain measuring device

A pellicle includes a pellicle membrane, which includes a porous thin film. The porous thin film includes a plurality of nanowires, which are arranged across one another to form a net structure. A photomask assembly includes the pellicle and a photomask, wherein the pellicle is fixed to a surface of the photomask.

Pellicle and photomask assembly including the same

A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.

Method of manufacturing photomask

Pellicle and exposure mask including the same

A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.

Pellicles and methods of manufacturing the same

Photomask and method of manufacturing the same

A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

Method of megasonic cleaning of an object

A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.

Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask

A system for monitoring haze of a photomask includes an installation unit in which a photomask is mounted, a light emission unit emitting a light beam to the photomask installed on the installation unit, a detection unit detecting a diffraction pattern of the light beam emitted by the light emission unit and passed through the photomask, and an analysis unit analyzing the diffraction pattern detected by the detection unit.

System for monitoring haze of a photomask

A pellicle frame, including aluminum, aluminum oxide, and a transition metal.

Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame

A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor device, a photosensitive film formed on a substrate is exposed through the photomask in which the ion trapping layer is formed on the transparent substrate, and the substrate is processed using the photosensitive film obtained as the result of the exposure.

Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask

Growing community of inventors

Seoul, South Korea

Jae-Hyuck Choi