United States of America As Represented by the Administrator of Nasa

The United States of America As Represented by the Administrator of the

Jacqueline W Quinn

Christian Anthony Clausen

Cherie L Geiger

Debra R Reinhart

Kathleen B Brooks

Christina Coon

Laura B Filipek

Cristina M Berger

Kristen M Milum

Brian S Aitken

Robert W DeVor

Nancy Ruiz

Phillip R Maloney

Cheri L Geiger

Robert Devor

Cherie L Yestrebsky

Christan A Clausen

Manoj B Chopra

Christian A Clausen

James G Captain

Robert W Devor

The present invention is a passive sensor to detect ionizing radiation over time. It employs a SAW sensor that incorporates a polymer film that deforms based on the chain-scission reaction as described upon irradiation. The polymer film coats the piezoelectric substrate and reflectors on the SAW sensor and, as it reacts to radiation, the film deforms due to the fracturing of the polymer molecules resulting in a loss of overall mass. As the SAW sensor is interrogated by an electrical signal, the wavelength of the response will change as the overall rigidity of the polymer film changes allowing for the detection of the level of radiation.

Passive sensor for measuring ionizing radiation

A treatment system and a method for removal of at least one halogenated compound, such as PCBs, found in contaminated systems are provided. The treatment system includes a polymer blanket for receiving at least one non-polar solvent. The halogenated compound permeates into or through a wall of the polymer blanket where it is solubilized with at least one non-polar solvent received by said polymer blanket forming a halogenated solvent mixture. This treatment system and method provides for the in situ removal of halogenated compounds from the contaminated system. In one embodiment, the halogenated solvent mixture is subjected to subsequent processes which destroy and/or degrade the halogenated compound.

Treatment system for removing halogenated compounds from contaminated sources

A hydrogenation catalyst including a base material coated with a catalytic metal is made using mechanical milling techniques. The hydrogenation catalysts are used as an excellent catalyst for the dehalogenation of contaminated compounds and the remediation of other industrial compounds. Preferably, the hydrogenation catalyst is a bimetallic particle including zero-valent metal particles coated with a catalytic material. The mechanical milling technique is simpler and cheaper than previously used methods for producing hydrogenation catalysts.

Mechanical alloying of a hydrogenation catalyst used for the remediation of contaminated compounds

PCBs are removed from contaminated media using a treatment system including zero-valent metal particles and an organic hydrogen donating solvent. The treatment system may include a weak acid in order to eliminate the need for a coating of catalytic noble metal on the zero-valent metal particles. If catalyzed zero-valent metal particles are used, the treatment system may include an organic hydrogen donating solvent that is a non-water solvent. The treatment system may be provided as a 'paste-like' system that is preferably applied to natural media and ex-situ structures to eliminate PCBs.

Zero-valent metallic treatment system and its application for removal and remediation of polychlorinated biphenyls (PCBs)

Emulsified systems of a surfactant-stabilized, biodegradable water-in-solvent emulsion with bimetallic particles contained with the emulsion droplets are useful at removing PCBs from ex situ structures. The hydrophobic emulsion system draws PCBs through the solvent/surfactant membrane. Once inside the membrane, the PCBs diffuse into the bimetallic particles and undergo degradation. The PCBs continue to enter, diffuse, degrade, and biphenyl will exit the particle maintaining a concentration gradient across the membrane and maintaining a driving force of the reaction.

Removal of PCB and other halogenated organic contaminants found in ex situ structures

A zero-valent metal emulsion is used to dehalogenate solvents, such as pooled dense non-aqueous phase liquids (DNAPLs), including trichloroethylene (TCE). The zero-valent metal emulsion contains zero-valent metal particles, a surfactant, oil and water. The preferred zero-valent metal particles are nanoscale and microscale zero-valent iron particles.

Zero-valent metal emulsion for reductive dehalogenation of DNAPLs

A zero-valent metal emulsion containing zero-valent metal particles is used to remediate contaminated natural resources, such as groundwater and soil. In a preferred embodiment, the zero-valent metal emulsion removes heavy metals, such as lead (Pb), from contaminated natural resources. In another preferred embodiment, the zero-valent metal emulsion is a bimetallic emulsion containing zero-valent metal particles doped with a catalytic metal to remediate halogenated aromatic compounds, such as polychlorinated biphenyls (PCBs), from natural resources.

Contaminant removal from natural resources

A zero-valent metal emulsion is used to dehalogenate solvents, such as pooled dense non-aqueous phase liquids (DNAPLs), including trichloroethylene (TCE). The zero-valent metal emulsion contains zero-valent metal particles, a surfactant, oil and water. The preferred zero-valent metal particles are nanoscale and microscale zero-valent iron particles

The invention provides a permeable treatment wall comprising one or more high-permeability columns, as well as a methods for preparing such a permeable treatment wall.

Reactive material placement technique for groundwater treatment

A method for increasing the effectiveness of a permeable treatment wall is described. The method includes the introduction of ultrasonic radiation in or near the wall. A permeable treatment wall is also described which has an ultrasonic radiation generating transducer in or near the wall. Permeable treatment walls are described as having either a well vertically extending into the wall, or a rod vertically extending into the treatment wall. Additionally, a method for adapting a permeable treatment wall to allow for the introduction of ultrasonic radiation in or near the wall is described.

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Titusville, FL, United States of America

Jacqueline W Quinn