Ciba Specialty Chemicals Corporation

Jacqueline Lau

Mervin Gale Wood

Joseph Suhadolnik

Ramanathan Ravichandran

Joseph E Babiarz

Deborah DeHessa

Rong Xiong

Andrew B Naughton

Jerome Sanders

Stephen D Pastor

Carmen Hendricks-Guy

Andrea R Smith

Peter Solera

Anthony DeBellis

Joseph Stephen Puglisi

David Bramer

Luther A R Hall

Michael P DiFazio

Christophe Bulliard

Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula A wherein at least one of G, Ror Rcontains a hindered amine moiety are extremely effective light stabilizers having both the UV absorbing activity of a benzotriazole and the light stabilizing efficacy of a hindered amine in the same molecule. These compounds are effective stabilizers for thermoset resin compositions, thermoplastic resin compositions, for photographic applications, for pigmented or dyed polypropylene, polyamide or polyester fibers, and for white, dyed, dipped, unscented and/or scented candle wax against discoloration and fading when incorporated therein alone or in combination with an antioxidant.

Benzotriazole/HALS molecular combinations and compositions stabilized therewith

Compounds which have a benzotriazole and a hindered amine moiety in the same molecule are typified by the formula Awherein at least one of G, Ror Rcontains a hindered amine moiety are extremely effective light stabilizers having both the UV absorbing activity of a benzotriazole and the light stabilizing efficacy of a hindered amine in the same molecule. These compounds are effective stabilizers for thermoset resin compositions, thermoplastic resin compositions, for photographic applications, for pigmented or dyed polypropylene, polyamide or polyester fibers, and for white, dyed, dipped, unscented and/or scented candle wax against discoloration and fading when incorporated therein alone or in combination with an antioxidant.

Benzotriazole/hals molecular combinations and compositions stabilized therewith

Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzoic ring, for example a trifluoromethyl group, which involves digitizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.

Processes for the preparation of benzotriazole UV absorbers

2H-Benzotriazole UV absorbers substituted at the 3-position and/or the 5-position of the phenyl ring by a phenyl moiety which is substituted by a heteroatom are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.

Benzotriazoles containing phenyl groups substituted by heteroatoms and compositions stabilized therewith

Provided is a process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, for example a trifluoromethyl group, which involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means. Also provided is a novel one-pot, multiphase reaction for the preparation of 2(2-nitrophenylazo) substituted phenols, which are precursors for 2H-benzotriazole UV absorbers.

2H-Benzotriazole UV absorbers substituted at the 3-position or at the 5-position of the phenyl ring by a 1,1-diphenylalkyl moiety, particularly a 1,1-diphenylethyl group, are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.

2H-benzotriazole UV absorbers substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith

2H-Benzotriazole UV absorbers substituted at the 3-position and/or the 5-position of the phenyl ring by &agr;-cumyl moiety which is substituted by a heteroatom are particularly photostable in automotive coatings, and are of low color and exhibit low volatility in thermoplastic compositions.

Benzotriazoles containing &agr;-cumyl groups substituted by heteroatoms and compositions stabilized therewith

2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith

A process for preparing 2H-benzotriazole UV absorbers containing a perfluoroalkyl moiety at the 5-position of the benzo ring, preferably a trifluoromethyl group, involves diazotizing the perfluoroalkyl substituted o-nitroaniline using concentrated sulfuric acid plus sodium nitrite or preferably nitrosylsulfuric acid to form the corresponding monoazobenzene intermediate via the diazonium salt intermediate which is reduced to the corresponding 5-perfluoroalkyl substituted 2H-benzotriazole UV absorber compound by conventional reduction means.

Process for the preparation of 5-perfluoroalkyl substituted benzotriazole UV absorbers

Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety and compositions stabilized therewith

Asymmetrical bis benzotriazoles of the formula I

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Jacqueline Lau