Asml Netherlands B.v.

Jacobus Johannus Leonardus Hendricus Verspay

Hans Jansen

Marco Koert Stavenga

Martinus Cornelis Maria Verhagen

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Patricius Aloysius Jacobus Tinnemans

Antonius Johannus Van Der Net

Franciscus Johannes Joseph Janssen

Antonius Theodorus Anna Maria Derksen

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Joeri Lof

Johannes Henricus Wilhelmus Jacobs

Alexander Straaijer

Roelof Frederik De Graaf

Nicolaas Ten Kate

Joost Jeroen Ottens

Michel Riepen

Theodorus Petrus Maria Cadee

Boris Menchtchikov

Johannes Anna Quaedackers

Herman Boom

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Richard Moerman

Koen Goorman

Marcel Johannus Elisabeth Hubertus Muitjens

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Franciscus Johannes Herman Maria Teunissen

Anthonie Kuijper

Maria Elisabeth Reuhman-Huisken

Aschwin Lodewijk Hendricus Johannes Van Meer

Edwin Augustinus Matheus Van Gompel

Edwin Van Gompel

Aschwin Lodewijk Hendricus Johannes Vermeer

Hans Butler

Helmar Van Santen

Aleksey Yurievich Kolesnychenko

Klaus Simon

Timotheus Franciscus Sengers

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Roelof Aeilko Siebrand Ritsema

Erik Theodorus Maria Bijlaart

Frank Van Schaik

Ronald Johannes Hultermans

Ton De Groot

Gerardus Everardus Marie Hannen

Pieter Willem Herman De Jager

Andrey Alexandrovich Nikipelov

Olav Waldemar Vladimir Frijns

Robert Gabriël Maria Lansbergen

Roelof Frederick De Graaf

Aukje Arianne Annette Kastelijn

Sipke Jacob Bijlsma

Mana Elisabeth Reuhman-Huisken

Franciscus Johaannes Herman Maria Teunissen

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector () and an electron accelerator (). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target () and a beam splitter () arranged to direct the a first portion of the electron beam along a first path towards a first side of the target () and to direct a second portion of the electron beam along a second path towards a second side of the target ().

Radioisotope production

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Immersion liquid, exposure apparatus, and exposure process

In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

Lithographic apparatus and device manufacturing method involving a liquid confinement structure

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

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Thorn, Netherlands

Jacobus Johannus Leonardus Hendricus Verspay