U.S. Philips Corporation

Koninklijke Philips Corporation N.v.

Samsung Electronics Co., Ltd.

Asml Netherlands B.v.

Polymer Vision Limited

Jacobus Bernardus Giesbers

Johannus Wilhelmus Weekamp

Gerwin Hermanus Gelinck

Menno W J Prins

Johannes Wilhelmus Weekamp

Menno Willem Jose Prins

Johan Hendrik Klootwijk

Fredericus Johannes Touwslager

Monique Johanna Beenhakkers

Cornelis Johannus Hermanus Antonius Rijpert

Vadim Yevgenyevich Banine

Sander Frederik Wuister

Johan Frederik Dijksman

Andre Bernardus Jeunink

Martinus Bernardus Van Der Mark

Roelof Koole

Jacobus J Ruigrok

Michel Marcel Jose Decre

Nico Maris Adriaan De Wild

Andreas Hubertus Montree

Johan Marra

Christianus Martinus Van Heesch

Adrianus P Severijns

Ruediger Mauczok

Martin Hillebrand Blees

Nicolaas P Willard

Adrianus Cornelius Van Kasteren

Ronald M Wolf

Petrus W J Linders

Martinus A Gijs

Franciscus W Dirne

Rogier Adrianus Henrica Niessen

Johannes F Cillessen

Paulus W Blom

Michel C J M Vissenberg

Edward W A Young

Bartholomeus Petrus Hendricus Van Nunen

Adrainus Cornelius Van Kasteren

Bartholomeus Peter Hendricus Van Nunen

Coenraad A A M Vugts

Marcel Bulder

Andreas C M Van Nes

Wilhelmus J J Welters

Peter Van Der Linde

Theodorus J A M Jans

Emiel Andreas Godefridus Peeters

A method of selectively sensing the concentration of a target gas in polluted ambient air comprises the steps of: &#x2014;providing a target gas sensor () sensitive to the target gas; &#x2014;providing a first gas flow derived from the ambient air, from which first flow the target gas is substantially removed; &#x2014;providing a second gas flow derived from the ambient air, substantially comprising the same target gas concentration as the ambient air; &#x2014;exposing the target gas sensor to the first gas flow during a first time interval, and obtaining from the sensor a first output signal (Smf); &#x2014;exposing the target gas sensor to the second gas flow during a second time interval not overlapping with the first time interval, and obtaining a second output signal (Smu); &#x2014;calculating the difference (S&#x394;) between the first and the second output signals; calculating the concentration of the target gas from the calculated signal difference (S&#x394;).

Gas sensing apparatus

An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

Imprint lithography method and imprintable medium

An electrical element, such as a thin-film transistor, is defined on a flexible substrate, in that the substrate is attached to a carrier by an adhesive layer, and is delaminated after definition of the transistor. This is for instance due to illumination by UV-radiation. An opaque coating is provided to protect any semiconductor material. A heat treatment is preferably given before application of the layers of the transistor to reduce stress in the adhesive layer.

Method of manufacturing a flexible electronic device and flexible device

A vertical interconnect () in an electronic device () is manufactured non-photolithographically. This is done by modifying a surface () of either a metal layer () or an intermediate layer of an electrically insulating material (), and subsequently depositing a composition with a first and a second polymer. Phase separation of the two polymers will lead to a first () and a second sub-layer (), of which the first sub-layer () is removed. An upper layer () of electrically conducting material can be deposited then or after a further etching step. This results in the vertical interconnect ().

Method of manufacturing an electronic device

A filter which includes a stack of deformable foils which are locally attached to one another, and also includes comparatively rigid members which are situated to both sides of the stack of foils, extend parallel to the surface of the foils and each of which is attached to an outer surface of the stack of foils by way of a buffer member. The foils can be moved away from one another in a main direction by means of the rigid members, which main direction extends transversely of the surface, in order to form ducts between the foils. The buffer member is then contractible mainly in a direction which extends parallel to the surface and transversely of the ducts.

Filter and X-ray examination apparatus

The invention relates to a method of manufacturing a filter which includes a number of ducts formed by a number of deformable foils. The foils have electrically insulating outer sides, with electrically conductive bands which are separated from one another by electrically insulating bands. The electrically conductive bands on a first outer side of the foil are arranged so as to be offset relative to the electrically conductive bands on the second outer side of the foil. The foils are stacked. The oppositely situated electrically insulating bands of the oppositely situated foils are interconnected. The foils are ultimately moved away from one another in a direction transversely of the foils in order to form the ducts between the interconnected foils. At least one detached, electrically insulating section is situated in a prolongation of at least one electrically conductive band and is not connected to an oppositely situated foil.

Method of manufacturing a filter, a filter thus manufactured and an X-ray examination apparatus

The invention relates to an X-ray apparatus which includes an adjustable X-ray filter. In order to adjust an intensity profile of the X-ray beam, an X-ray absorbing liquid is transported to filter elements of the X-ray filter. Such transport is susceptible to gravitational forces which lead to an irregular hydrostatic pressure distribution in the X-ray filter. In order to reduce the effects of the gravitational forces on the transport of the X-ray absorbing liquid, the duct connecting the filter elements to the reservoir is subdivided into sub-ducts and the reservoir is subdivided into chambers, each chamber being connected to at least one sub-duct. The X-ray apparatus also includes means for keeping the sub-ducts aligned with a horizontal plane.

X-ray examination apparatus

The X-ray examination apparatus includes an X-ray source, an X-ray detector and an X-ray filter which is located between the X-ray source and the X-ray detector. The X-ray filter includes elements, notably capillary tubes, and the X-ray absorptivity of separate filter elements is adjustable by adjustment of a quantity of X-ray absorbing liquid in the respective filter elements. The quantity of X-ray absorbing liquid in the individual filter elements is adjusted by way of electric voltages applied to the individual filter elements. A control system is provided to apply the electric voltages selectively to the individual filter elements. The control system includes voltage lines and switching elements which electrically couple the filter elements to an electric voltage source. The filter elements are formed by spaces between corrugated plates or parallel plates provided with separating members, such as protrusions which extend transversely of the plates. The voltage lines are disposed on the plates. Preferably, the plates are formed from a stack of extendable wall foils and separating foils are provided partially between the wall foils so as to adapt the spacing of the voltage lines to the spacing of the switching elements.

X-ray examination apparatus including an X-ray filter

A semiconductor device includes a transparent switching element (1) with two connection electrodes (2, 3) of a transparent material and an interposed transparent channel region (4) of a semiconductor material provided with a transparent gate electrode (5) of a conductive material, separated from the channel region (4) by a transparent insulating layer (6). The semiconductor material is a degenerate semiconductor material with a basic material having a bandgap (10) between conduction band (11) and valence band (12) of electrons greater than 2.5 eV and a mobility of charge carriers greater than 10 cm.sup.2 /Vs provided with dopant atoms which form a fixed impurity energy level (13) adjacent or in the valence band (12) or conduction band (11) of the basic material. The degenerate semiconductor material is transparent because the absorption of visible light is not possible owing to the great bandgap (10), while also no absorption of visible light takes place through the impurity energy levels (13). The device is capable of comparatively fast switching.

Semiconductor device having a transparent switching element

A magneto-resistance device comprises a stacked structure, which stacked structure has a non-conducting substrate having a surface on which a multilayer structure is provided. The surface is furnished with a plurality of grooves which are substantially mutually parallel, each groove comprising a first and a second face. All first faces are substantially planar and mutually parallel. The constituent layers of the multilayer structure are provided in a stack upon each first face in such a manner as to be parallel thereto, the thickness of the stacks being such that each stack makes physical contact with each immediately neighbouring stack.

Magneto-resistance device, and magnetic head comprising such a device

A method of manufacturing one or more magnetic heads starts from a substrate (11) on which a first magnetic layer (13) is provided. A recess (15) is formed in this layer at the location of a transducing gap to be formed, after which a gap layer (19) is provided on a bounding wall (17) of the recess. Subsequently, the recess is filled with a second magnetic layer (23) and a counterblock (31) is provided on the layers after surface-polishing. Finally, a winding aperture is provided.

Method of manufacturing a magnetic head

Growing community of inventors

Eindhoven, Netherlands

Jacobus Bernardus Giesbers