Edwards Limited

Jack Raymond Tattersall

Nigel Paul Schofield

Neil Turner

Andrew James Seeley

Alan Ernest Kinnaird Holbrook

Christopher Mark Bailey

Duncan Michael Price

Gary Peter Knight

Malcolm William Gray

Michael Roger Czerniak

Darren Mennie

Derek Martin Baker

Ingo Stephen Graham

Clive Marcus Lloyd Tunna

Matthew Richard Wickes

Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

Apparatus for evacuating a corrosive effluent gas stream from a processing chamber

In situations where a vacuum system is suddenly overloaded, there is a risk of mechanical damage being sustained, for example, bearing damage, gear slippage or rotor and/or stator collisions. Sudden overloads can also lead to electrical damage, for example, over-currents or power surges. Therefore a pressure regulating apparatus is provided for use in a vacuum pumping system having an inlet, an outlet and a conduit interposed between, and in fluid communication with, the inlet and the outlet, wherein the cross-sectional area of the conduit is greater than that required to meet the conductance requirements of the inlet and the outlet.

Pressure regulating apparatus including conduit

A pair of Northey rotors for a vacuum pump, in which each rotor comprises two opposing, substantially parallel faces, and a peripheral surface located between the opposing faces. In order to reduce damage caused by pumping a gas stream containing liquid or solid particulates, a plurality of grooves is located on the peripheral surface for accommodating the particulates.

Vacuum pump

Growing community of inventors

Victoria, Australia

Jack Raymond Tattersall