Asml Netherlands B.v.

Phoqus Pharmaceuticals Limited

Jack Michael Gazza

Jonghoon Baek

David Robert Evans

Mathew Cheeran Abraham

David Hoover Feather

Douglas Howard Nelson

Marshall Whiteman

Martin David Hallett

A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

An apparatus for electrostatically applying a powder material to a solid dosage from includes a source () of charged powder material, a support assembly () for supporting the solid dosage form () with a front face in the vicinity of the source of powder material and facing the source of powder material, the support assembly () including an electrically conducting member () in the vicinity of the rear face of the solid dosage form and an electrically conducting shield () disposed closely around the solid dosage from () between the front face and the rear face of the solid dosage form, and means () for creating a potential difference between the source of powder material and the electrically conducting member and for maintaining the electrically conducting shield at a potential more similar to that of the source of powder material than to that of the electrically conducting member.

Electrostatic application of powder material to solid dosage forms utilizing an electrically conductive shield

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San Diego, CA, United States of America

Jack Michael Gazza