Taiwan Semiconductor Manufacturing Comp. Ltd.

Other

Street Cars, Inc.

Jack Liu

Charles Chew-Yuen Young

Jiann-Tyng Tzeng

Kuo-Nan Yang

Shao-Yu Chou

Tze-Chiang Huang

Sing-Kai Huang

Chih-Liang Chen

Sheng-Hsiung Chen

Chew-Yuen Young

Chewn-Pu Jou

Huan-Neng Chen

Kam-Tou Sio

Feng Wei Kuo

Lan-Chou Cho

Jerry Chang Jui Kao

William Wu Shen

Hsin-Cheng Chen

Wei-Cheng Lin

Yun-Han Lee

Wei Min Chan

Lei-Chun Chou

Chun-Hung Liou

Wei-Cheng Wu

Hui-Ting Yang

Li-Wen Wang

Ching-Fang Huang

Charlie Zhou

Hung-Jen Liao

Chung-Cheng Chou

Jonathan Tsung-Yung Chang

Chiting Cheng

Huang-Yu Chen

Yung-Chen Chien

Wei-Hsiang Ma

Yi-Chuin Tsai

Chung-Hsing Wang

Chien-Kuo Su

Shang-Wei Fang

Yi-Wei Lin

Chun-Cheng Ku

Hui-ting Yang

Jerry Kao

Hsiu-Hui Yang

Phillip Percuoco

An integrated circuit includes a device, a first interconnect structure disposed above the device and a second interconnect structure positioned below the device. The first interconnect structure includes multiple frontside metal layers. The second interconnect structure includes multiple backside metal layers, where each backside metal layer includes metal conductors routed according to diagonal routing. In some embodiments, a backside interconnect structure can include another backside metal layer that includes metal conductors routed according to mixed-Manhattan-diagonal routing. A variety of techniques can be used to route signals between metal conductors in the backside interconnect structure and cells on one or more frontside metal layers.

Diagonal backside power and signal routing for an integrated circuit

A method includes: providing a cell of a first group that supplies a first potential from a backside of a substrate, multiple cells of a second group, and two cells of a third group that supply a second potential from the backside; determining a distance in a row direction between the cell of the first group and each of the two cells of the third group; determining a placement of the cell of the first group, the two cells of the third group, and each of the cells of the second group; and counting a number of pins of the cells of the second group. The cell of the first group is located between the two cells of the third group. Each of the cells of the second group is located between the two cells of the third group.

Methods related to forming semiconductor devices

In some embodiments, a semiconductor device is provided. The semiconductor device includes a semiconductor substrate having a first semiconductor material layer separated from a second semiconductor material layer by an insulating layer. A first access transistor is arranged on the first semiconductor material layer, where the first access transistor has a pair of first source/drain regions having a first doping type. A second access transistor is arranged on the first semiconductor material layer, where the second access transistor has a pair of second source/drain regions having a second doping type opposite the first doping type. A resistive memory cell having a bottom electrode and an upper electrode is disposed over the semiconductor substrate, where one of the first source/drain regions and one of the second source/drain regions are electrically coupled to the bottom electrode.

Method and related apparatus for improving memory cell performance in semiconductor-on-insulator technology

Disclosed embodiments herein relate to an integrated circuit including power switches with active regions connected to form a contiguous region. In one aspect, the integrated circuit includes a first layer including a first metal rail extending in a first direction. In one aspect, the integrated circuit includes a second layer above the first layer along a second direction perpendicular to the first direction. The second layer may include active regions for power switches. In one aspect, the active regions of the power switches are connected to form a contiguous region extending in the first direction. The first metal rail may be electrically coupled to the active regions through via contacts. In one aspect, the integrated circuit includes a third layer above the second layer along the second direction. The third layer may include a second metal rail electrically coupled to some of the power switches through additional via contacts.

Power switch for backside power distribution

One aspect of this description relates to an integrated circuit (IC) structure including a first layer and a second layer. The first layer includes a first metal structure coupled to a first power supply having a first voltage level and a second metal structure coupled to a second power supply having a second voltage level different from the first voltage level. The second layer is formed over the first layer. The second layer includes a first nano-sheet device coupled to the first metal structure and a second nano-sheet device adjacent to the first nano-sheet device. The second nano-sheet device is coupled to the second metal structure. A distance between the first nano-sheet device and the second nano-sheet device is less than a minimum n-well to n-well spacing.

Multiple power domains using nano-sheet structures

In some embodiments, a semiconductor device is provided. The semiconductor device includes a semiconductor substrate having a first semiconductor material layer separated from a second semiconductor material layer by an insulating layer. A source region and a drain region are disposed in the first semiconductor material layer and spaced apart. A gate electrode is disposed over the first semiconductor material layer between the source region and the drain region. A first doped region having a first doping type is disposed in the second semiconductor material layer, where the gate electrode directly overlies the first doped region. A second doped region having a second doping type different than the first doping type is disposed in the second semiconductor material layer, where the second doped region extends beneath the first doped region and contacts opposing sides of the first doped region.

Silicon on insulator semiconductor device with mixed doped regions

An integrated circuit includes first through fourth devices positioned over one or more substrates, a first radio frequency interconnect (RFI) including a first transmitter included in the first device, a first receiver included in the second device, and a first guided transmission medium coupled to each of the first transmitter and the first receiver, a second RFI including a second transmitter included in the first device, a second receiver included in the third device, and a second guided transmission medium coupled to each of the second transmitter and the second receiver, and a third RFI including a third transmitter included in the first device, a third receiver included in the fourth device, and the second guided transmission medium coupled to each of the third transmitter and the third receiver.

Integrated circuit with radio frequency interconnect

A semiconductor device includes a substrate, a dielectric region, a first fin structure, a second fin structure, a plurality of conductive regions, a first conductive rail and a conductive structure. The dielectric region is situated on the substrate. The first fin structure protrudes from the substrate and the dielectric region. The second fin structure protrudes from the substrate and the dielectric region, and extends parallel to the first fin structure. The conductive regions are situated on the dielectric region. The first conductive rail is situated within the dielectric region, and electrically connected to a first conductive region of the plurality of conductive regions. Opposite sides of the first conductive rail face the first fin structure and the second fin structure, respectively. The conductive structure penetrates through the substrate and formed under the first conductive rail, and is electrically connected to the first conductive rail.

Semiconductor device integrating backside power grid and related integrated circuit and fabrication method

A clock distribution system includes a clock mesh structure which has a plurality of first metal patterns extending along a first axis, a plurality of second metal patterns extending along a second axis, a plurality of third metal patterns extending along a third axis. The plurality of first metal patterns, the plurality of second metal patterns, and the plurality of third metal patterns are electrically coupled with each other. The second axis is transverse to the first axis. The third axis is oblique to both the first axis and the second axis.

Clock signal distribution system, integrated circuit device and method

Some embodiments of the present disclosure relate to a memory device. The memory device includes an active current path including a data storage element; and a reference current path including a reference resistance element. The reference resistance element has a resistance that differs from a resistance of the data storage element. A delay-sensing element has a first input coupled to the active current path and a second input coupled to the reference current path. The delay-sensing element is configured to sense a timing delay between a first signal on the active current path and a second signal on the reference current path. The delay-sensing element is further configured to determine a data state stored in the data storage element based on the timing delay.

Asynchronous read circuit using delay sensing in magnetoresistive random access memory (mRAM)

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Taipei, Taiwan

Jack Liu