Fujifilm Electronic Materials U.s.a., Inc.

Jack Helzer

Marcia Jo Cole-Yocom

Bryan Hinzie

Yuan Chen

Pejman Ahmadiannamini

Michael R Barker

Shen-Ping Huang

Perry Westberg

Marcia Cole-Yocom

A method for process a chemical liquid is provided. The method includes at least providing a system having at least one filtration medium, treatment the system with a treatment liquid having a content of iron (Fe) and calcium (Ca) of about 10 ppb or less, and processing a chemical liquid using an apparatus having the system configured therein after the treatment process.

Method for processing chemical liquid

A chemical liquid manufacturing apparatus is provided. The manufacturing apparatus at least includes an ion exchange medium and an ion adsorption medium configured downstream from the ion exchange medium. A material of the ion adsorption medium includes a resin material having an amide bond or an imide bond. A manufacturing method of a chemical liquid using the apparatus is also provided.

Chemical liquid manufacturing apparatus and manufacturing method of chemical liquid

A chemical liquid manufacturing apparatus, including a first system and a second system, is provided. The first system includes at least one first filtration medium, selected from a first filter, a first ion exchange membrane and a first ion adsorption membrane, wherein the first system is configured to process a material of at least one time. The second system includes at least one second filtration medium, selected from a second filter, a second ion exchange membrane and a second ion adsorption membrane, wherein the second system is configured for recirculation and to process the material of at least two times.

Chemical liquid manufacturing apparatus

The present disclosure is directed to methods of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

Growing community of inventors

Chandler, AZ, United States of America

Jack Helzer