Government of the United States of America, As Represented by the Secretary of Commerce

Fei Comapny

Jabez J McClelland

Adam V Steele

Brenton J Knuffman

Robert J Celotta

Vladimir P Oleshko

Jonathan H Orloff

Marcus Jacka

Christopher Lloyd Soles

Shannon B Hill

Harold Craighead

Truman Wilson

Rajeev Gupta

James L Hanssen

A prelithiated lithium ion battery includes: ion beam implanted lithium; a cathode; and an anode disposed on the cathode and an electrolyte in electrical communication with the cathode and the anode, the cathode or the anode including the ion beam implanted lithium such that: when the cathode includes the ion beam implanted lithium, the ion beam implanted lithium is present in an absence of solid electrolyte interface composition in the cathode; and when the anode includes the ion beam implanted lithium, the ion beam implanted lithium is present in an absence of solid electrolyte interface composition in the anode.

Prelithiated lithium ion battery and making a prelithiated lithium ion battery

An articles includes: an ion source configured to provide a first ion beam that has a first brightness; and a cooler configured to receive the first ion beam and to produce a second ion beam from the first ion beam, the second ion beam including a second brightness that is greater than the first brightness. A process for cooling includes receiving a first ion beam that includes a first brightness in a cooler, and the cooler includes a first mirror and a second mirror disposed opposingly to the first mirror; receiving a first laser beam in the cooler; receiving a second laser beam in the cooler; transmitting the first laser beam and the second laser beam through the first ion beam to decrease an emittance of the first ion beam; reflecting the first laser beam from the first mirror and the second laser beam from the second mirror; and transmitting, after being reflected, the first laser beam and the second laser beam through the first ion beam to cool the first ion beam and to decrease the emittance of the first ion beam to produce a second ion beam that includes a second brightness that is greater than the first brightness.

Ion source and method for making same

A method for aligning the axis of an atom beam with the orientation of an electric field at a particular location within an enclosure for use in creating a charged particle source by photoionizing a cold atom beam. The method includes providing an atom beam in the enclosure, providing a plurality of electrically conductive devices in said enclosure, evacuating the enclosure to a pressure below about 10millibar, and aligning the axis of the atom beam with the orientation of the electric field, relative to each other, within less than about two degrees. Alignment may be facilitated by applying at least one voltage to the electrically conductive devices, mechanically tilting the atom beam's axis orientation of the electric field relative to each other and/or causing a deflection of the atom beam.

Alignment of an atom beam with an electric field in the production of a charged particle source

A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of laser light is produced. The produced atom beam is spatially compressed along each transverse axis, thus reducing the cross-sectional area of the produced beam and reducing a velocity spread of the produced beam along directions transverse to the beam's direction of propagation. Laser light is directed onto at least a portion of the neutral atoms in the atom beam, thereby producing ions and electrons. An electric field is generated at the location of the produced ions and electrons, thereby producing a beam of ions traveling in a first direction and electrons traveling in substantially the opposite direction. A vacuum chamber contains the atom beam, the ion beam and the electron beam.

Charged particle source from a photoionized cold atom beam

An integrated optical element and Faraday cup that can measure charged particle beam currents, manipulate light and analyze charged particle beam energy distribution. One boundary of the cup is formed by a lens or other suitable optical element which can be used for manipulating light along the axis of the Faraday cup. The surface of the optical element interior to the cup is coated with a transparent conductor in order to establish the simultaneous functions of taking charged particle beam current measurements, taking energy distribution measurements and manipulating light for such applications as focusing or imaging. A suppressor/blanker/retarder electrode is designed to eliminate spurious current signals that can result from production of secondary electrons by the charged particle beam impinging on the electrode surface.

Integrated optical element and Faraday cup

An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source.

Distributed ion source acceleration column

A system and method are disclosed for producing a source of ions, and particularly, a focused ion beam. The system and method use a magneto-optical trap (MOT) to produce a population of neutral atoms. A laser is then utilized to ionize atoms and produce a population of ions. An extraction element is then used to transfer the ions so that they can be used in a wide array of applications.

Magneto-optical trap ion source

A metastable depassivation lithography process for fabricating microstructures on a surface which utilizes the energy contained in neutral metastable rare gas atoms to remove passivating atoms from selected areas of a surface. Removal of the passivating atoms in a pattern allows further chemical processing to add or remove material to the exposed areas. The neutral metastable rare gas atoms can be directed to the surface using atom optical techniques to effect a desired pattern of exposure by the atoms. Alternatively, a mask can be used to effect a desired pattern of exposure.

Method of fabricating of structures by metastable atom impact desorption

A lithography process which utilizes metastable atoms for resist exposure is disclosed. Metastable rare gas atoms, instead of photons, electrons or ions, are directed at the surface of a lithographic resist. On impact, the metastable atoms release up to 20 eV of energy per atom in the form of secondary electrons. These secondary electrons alter chemical bonds in the resist, causing it to become either soluble or insoluble in an appropriate developer solution. The metastable rare gas atoms can further be manipulated with the new techniques of atom optics to focus them, improve their collimation and intensity, or modulate them.

Exposure of lithographic resists by metastable rare gas atoms

A method of depositing atoms on a substrate in which a beam of atoms is optically focused utilizing a laser beam. The laser beam is used to form a standing wave above the surface of a substrate. As the beam of atoms is passed through the standing wave, the atoms are focused by dipole force interactions. The deposition of atoms is focused into parallel lines which coincide with the minima of the standing wave. The use of two standing waves allows for focusing the atoms into discrete dots or spots. Relative movement between the substrate and the standing wave(s) allows for depositing atoms in a scanning manner. Various nanostructures can be made by the disclosed method.

Growing community of inventors

Bethesda, MD, United States of America

Jabez J McClelland