Agilent Technologies, Inc.

J Mark Foster

John F Casey

A preferred method includes providing a substrate and depositing a capacitor material upon the substrate. A portion of the capacitor material is then removed to form an interdigitated capacitor structure that incorporates a first contact and a second contact. Thereafter, a dielectric material is applied upon the interdigitated capacitor structure so that the structure is at least partially encapsulated by the substrate and the dielectric material. Capacitor structures also are provided.

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Colorado Springs, CO, United States of America

J Mark Foster