Nippon Paint Compnay, Ltd.

Sumitomo Metal Industries, Inc.

Iwao Sumiyoshi

Masami Kawabata

Akihiko Sato

Hiroshi Tsushima

Masaaki Yokoyama

Tamio Iimure

Tetsuzo Arai

Emi Watanabe

Masakazu Ohkita

Akio Tomotsugu

Ryoii Ishihara

Koichi Yamada

Manasori Yoshiiwa

Kenzo Mizutani

Emi Ueta

The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:

Method for forming thin film pattern

A photosensitive composition for volume hologram recording used for recording an interference fringe produced by the interference of laser beams or lights having excellent coherence as a fringe having a different refractive index, the composition comprising:

Photosensitive composition for volume hologram recording

The present invention provides a photosensitive resin composition wherein a sensitiveness of polysilane to photodegradation is improved and a time required for photodegradation is short. The photosensitive resin composition comprises:

Polysilane type photosensitive resin composition and method for forming

The present invention provides a photosensitive composition for volume hologram recording, comprising the following components:

Disclosed is a photosensitive composition for volume hologram recording which is used for recording an interference fringe produced by a laser beam or a light having excellent coherence, as fringes having different refractive index. The composition comprising:

The present invention provides the near infrared polymerizable composition which has high sensitivity sufficient to provide excellent curability to the coating composition containing the same, even if the coating composition contains the pigment as well. The present invention provides a near infrared polymerizable composition comprising a cyanine dye, a S-triazine compound, an organoboron salt and an ethylenically unsaturated compound.

Near infrared polymerizable composition

The present invention provides the color pattern forming method wherein the process is simple and therefore the product can be manufactured at a low cost and it is possible to obtain an RGB color filter with superior pattern precision.

Method of forming color pattern on a polysilane layer

Photopolymerizable composition

A radiation curable primer coating composition is provided comprising (a) a reaction product of an epoxide compound and an ethylenically unsaturated monocarboxylic acid, (b) a compound of the formula: ##STR1## wherein R is hydrogen atom or methyl, A is a C.sub.2 -C.sub.4 alkylene group, and n is 0, 1 or 2; and (c) a compound having at least one epoxy group per molecule. The composition may be applied onto a steel substrate and cured by the irradiation of an actinic radiation for improving properties of subsequently applied polyolefin coatings thereon.

Radiation curable primer coating compositions

A photo-curable coating composition having a high hiding power which comprises (1) a photo-curable, urethane-modified polymer having at least one unsaturation originated in the acrylate or methacrylate moiety and a molecular weight of which the proportion to the number of said unsaturation is 200-10,000, (2) an .alpha.,.beta.-ethylenically unsaturated compound copolymerizable with said acrylate or methacrylate moiety, (3) a photo-sensitizer, and (4) a coloring agent.

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Osaka, Japan

Iwao Sumiyoshi