Mitsubishi Chemical Corporation

Iwao Matsuo

Mineo Nishi

Koji Nakano

Keisuke Nakano

A photosensitive resin composition comprising an alkali-soluble resin, a quinonediazide-type photosensitive compound and a solvent, wherein the photosensitive compound comprises 1 a quinonediazide sulfonate of a novolak resin (A) of the following formula (i) having a weight average molecular weight of from 600 to 2,200 or a novolak resin (B) of the following formula (ii) having a weight average molecular weight of from 600 to 2,200, and 2 a quinonediazide sulfonate of a hydroxybenzophenone (C) of the following formula (iii): ##STR1## wherein each of R.sup.1 and R.sup.4 is an alkyl group, R.sup.2 is an alkyl group or an aryl group, R.sup.3 is a hydrogen atom or an alkyl group, each of u and v is an integer of from 0 to 3, provided that when each of R.sup.1 to R.sup.4 is present in a plurality, the plurality of each of R.sup.1 to R.sup.4 may be the same or different, and each of k and l is a number of at least 0, provided that k:l=1:9 to 10:0; ##STR2## wherein R.sup.5 is a hydroxyl group or a alkyl group, each of R.sup.6 and R.sup.9 is a hydrogen atom, an alkyl group or an aryl group, each of R.sup.7 and R.sup.10 is a hydrogen atom or an alkyl group, R.sup.8 is an alkyl group, x is an integer of from 0 to 2, y is an integer of from 0 to 3, provided that when each of R.sup.5 to R.sup.10 is present in a plurality, the plurality of each of R.sup.5 to R.sup.10 may be the same or different, and each of m and n is a number of at least 0, provided that m:n=10:0 to 6:4; ##STR3## wherein each of p and q is an integer of at least 0, provided that 3.ltoreq.p+q.ltoreq.6.

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Osaka, Japan

Iwao Matsuo