Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Ivo Vanderhallen

Ruud Antonius Catharina Maria Beerens

Olav Waldemar Vladimir Frijns

Alexander Matthijs Struycken

Erik Roelof Loopstra

Sjoerd Nicolaas Lambertus Donders

Vadim Yevgenyevich Banine

Nicolaas Ten Kate

Johannes Hubertus Josephina Moors

Jan Bernard Plechelmus Van Schoot

Theodorus Petrus Maria Cadee

Andrei Mikhailovich Yakunin

Gerardus Hubertus Petrus Maria Swinkels

Jan Steven Christiaan Westerlaken

Stig Bieling

Antonius Theodorus Wilhelmus Kempen

Henricus Gerardus Tegenbosch

Richard Henricus Adrianus Van Lieshout

Uwe Bruno Heini Stamm

Jacob Kleijn

Gerrit Van Der Straaten

Hermanus Kreuwel

Marcus Petrus Scheepers

Remco Johannes Elisa Heijmans

There is described a connection assembly () for a high-pressure liquid metal supply system used in an EUV light source comprising a monolithic block, wherein the monolithic block includes: at least one connection () for connecting to a reservoir () configured to hold liquid metal; interior passages () configured to fluidly connect the at least one connection with at least two liquid metal outlets/inlets (); at least two freeze valves () configured to block a passage by solidifying liquid metal therein. Also described is a liquid metal storage assembly including such a connection assembly, a lithography apparatus including such a liquid metal storage assembly or such a connection assembly, as well as the use of such assemblies or apparatus in a lithographic apparatus or method.

Connection assembly

A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

Radiation conduit

A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Radiation collector, radiation source and lithographic apparatus

A radiation source having a fuel stream generator () that generates and directs a fuel stream () along a trajectory towards a plasma formation location (). A pre-pulse laser radiation assembly directs a first beam of laser radiation () at the fuel stream at the plasma formation location to generate a modified fuel target (). A main pulse laser radiation assembly directs a second beam of laser radiation () at the modified fuel target at the plasma formation location to generate a radiation generating plasma (). A collector () collects the radiation and directs it along an optical axis () of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

Radiation source

A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

Optical element mount for lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Ivo Vanderhallen