Asml Netherlands B.v.

Ivo Adam Johannes Thomas

Siebe Landheer

Jeroen Peter Johannes Bruijstens

Marcio Alexandre Cano Miranda

Gheorghe Tanasa

Arnout Johannes Meester

Marcus Adrianus Van De Kerkhof

Franciscus Johannes Joseph Janssen

Marcel Beckers

Hans Jansen

Johannes Henricus Wilhelmus Jacobs

Thibault Simon Mathieu Laurent

Richard Joseph Bruls

Ronald Van Der Ham

Ruud Hendrikus Martinus Johannes Bloks

Bauke Jansen

Gerben Pieterse

Gregory Martin Mason Corcoran

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Johan Gertrudis Cornelis Kunnen

Martijn Houben

Sander Catharina Reinier Derks

Laurentius Catrinus Jorritsma

Marinus Jan Remie

Maurice Martinus Johannes Van Der Lee

Lambertus Dominicus Noordam

Gerardus Adrianus Antonius Maria Kusters

Wouterus Johannes Petrus Maria Maas

Yücel Kök

Bartholomeus Mathias Van Oerle

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

Lithographic apparatus and device manufacturing method

A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Lithographic apparatus and method of operating the apparatus

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.

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Son, Netherlands

Ivo Adam Johannes Thomas