Monolithic 3d Inc.

Isreal Beinglass

Zvi Or-Bach

Deepak Chandra Sekar

Brian Cronquist

Jan Lodewijk De Jong

A method to fabricate a semiconductor device, including the sequence of: implanting one or more regions on a semiconductor wafer forming a doped layer; performing a first transfer of the doped layer onto a carrier; and then performing a second transfer of the doped layer from the carrier to a target wafer; and then etching said one or more regions of the doped layer to form transistors on the doped layer.

Method of fabricating a semiconductor device and structure

A method for fabricating a device, the method including: providing a first layer including first transistors wherein the first transistors include mono-crystalline semiconductor and first alignment marks; overlaying a second semiconductor layer over the first layer, wherein the second layer includes second transistors, the second transistors include mono-crystalline semiconductor and are configured to be memory cells, at least one of the memory cells include a floating body region configured to be charged to a level indicative of a state of the memory cell, and fabricating the second transistors includes alignment to the first alignment marks.

Method for fabrication of a semiconductor device and structure

Systems and methods are disclosed for fabricating a semiconductor device, includes implanting one or more regions on a semiconductor wafer; performing a layer transfer onto a carrier; and transferring from said carrier to a target wafer.

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Sunnyvale, CA, United States of America

Isreal Beinglass