Oerlikon Solar Ag, Trubbach

Oerlikon Solar Ag, Truebbach

Israel Wagner

Stefan Schneider

Jiri Vyskocil

An apparatus and method are provided for improved utilization of a sputter target in the longitudinal end regions. The focus of erosion in the end regions is widened, thereby extending the useful life of the target. This provides improved efficiency and reduces waste because a greater proportion of the target material in the more expansive central region can be harvested, because the target is utilized for a longer period of time.

Sputter target utilization

The magnetron sputtering arrangement () comprises a target arrangement () comprising a target () having a sputtering surface () the shape of which defines a first (Aand a second axis (A) being mutually perpendicular and being, at least approximately, axes of mirror-symmetry of the sputtering surface; a magnet arrangement () generating a magnetic field above said sputtering surface; and a drive () adapted to establishing a substantially transitional relative movement between said magnetron magnetic field and said sputtering surface. Said relative movement describes a path () defining a third (A) and a fourth axis (A) being mutually perpendicular and being, at least approximately, axes of mirror-symmetry of the path (). Said third axis is at least approximately parallel to said first axis (A), and said path () has at least two pointed corners (), each corner located on one of said third axis (A) and said fourth axis (A). Preferably, the relative movement is a repetitive movement, and preferably the path describes substantially the shape of a rhombus. The magnetron sputtering arrangement () may comprise at least two of said target arrangements (), magnet arrangements () and drives ().

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Sargans, Switzerland

Israel Wagner