Dcg Systems Gmbh

Fei Efa, Inc.

Israel Niv

Vladimir Ukraintsev

Prasad Sabbineni

Ronen Benzion

Thomas Kujawa

System for performing in-line nanoprobing on semiconductor wafer. A wafer support or vertical wafer positioner is attached to a wafer stage. An SEM column, an optical microscope and a plurality of nanoprobe positioners are all attached to the ceiling. The nanoprobe positioners have one nanoprobe configured for physically contacting selected points on the wafer. A force (or touch) sensor measures contact force applied by the probe to the wafer (or the moment) when the probe physically contacts the wafer. A plurality of drift sensors are provided for calculating probe vs. wafer alignment drift in real-time during measurements.

Through process flow intra-chip and inter-chip electrical analysis and process control using in-line nanoprobing

A collection optics having variable magnification, and which enable changing magnification without stopping the spray cooling. The variable magnification is provided by a turret that carries several objectives of different magnifications. A frame is provided above the turret, wherein the spray cooling is provided. By rotating the turret and changing its elevation, different objectives of the turret can be 'docked' to a docking port within the frame.

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Los Altos Hills, CA, United States of America

Israel Niv