Sumitomo Chemical Company, Limited

Isao Yoshida

Koji Ichikawa

Yukako Harada

Satoshi Yamaguchi

Yoshiyuki Takata

Makoto Akita

Ichiki Takemoto

Nobuo Ando

Kazuhiko Hashimoto

Yuichi Mukai

Masashi Komatsu

Takayuki Miyagawa

Hirokazu Murata

Kazuyuki Yamagata

Mari Yuasa

Hirotoshi Nakanishi

Masako Sugihara

Masumi Suetsugu

Yuki Suzuki

Yusuke Fuji

Junji Shigematsu

Yuko Yamashita

Soon Shin Kim

Masami Yoshida

A salt represented by formula (I): wherein Qand Qindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group,Rand Rindependently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group,z represents an integer of 0 to 6,Xrepresents *&#x2014;C(&#x2550;O)&#x2014;O&#x2014;, *&#x2014;O&#x2014;C(&#x2550;O)&#x2014;, *&#x2014;O&#x2014;C(&#x2550;O)&#x2014;O&#x2014; or &#x2014;O&#x2014;, where * represents a binding site to &#x2014;C(R)(R)&#x2014; or &#x2014;C(Q)(Q)-,Arepresents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent,Rrepresents a hydrogen atom or a methyl group, andZrepresents an organic cation.

Salt and photoresist composition containing the same

A compound represented by formula (I): wherein

Compound, resin, photoresist composition, and method for producing photoresist pattern

Salt, photoresist composition, and method for producing photoresist pattern

A compound represented by the formula (I): wherein Rrepresents a hydrogen atom etc., Rand Reach independently represent a hydrogen atom etc., Rrepresents a C1-C8 divalent hydrocarbon group, Rrepresents a single bond etc., and Rrepresents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.

Compound and chemically amplified positive resist composition

A salt represented by formula (I): wherein Q, Q, L, W, and Zare defined in the specification.

Salt, photoresist composition and method for producing photoresist pattern

A salt represented by the formula (X): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring Wrepresents a C4-C36 lactone ring, Ris a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Zrepresents an organic counter ion, and Wrepresents a group represented by the formula (X-1): wherein Lrepresents a single bond etc., ring Wrepresents a C3-C36 saturated hydrocarbon ring in which one &#x2014;CH&#x2014; is replaced by &#x2014;CO&#x2014; and in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Rrepresents a C1-C12 hydrocarbon group, Ris a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris a hydroxyl group etc., Ris a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q, Q, L, W, W, R, R, t1 and t2 are defined in the specification, and Zrepresents an organic cation.

A salt represented by the formula (a): wherein Qand Qeach independently represent a fluorine atom etc.,

A salt represented by the formula (I): wherein Q, Q, L, L, ring W, s, t, R, Rand Zare defined in the specification.

Salt, photoresist composition and process for producing photoresist pattern

The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Zrepresents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

Photoresist composition

The present invention provides a salt represented by the formula (I): wherein Qand Qindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, Land Lindependently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring Wand ring Windependently each represent a C3-C36 aliphatic ring, Ris independently in each occurrence a C1-C6 alkyl group, Ris independently in each occurrence a C1-C6 alkyl group, Rrepresents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Zrepresents an organic counter ion.

Salt and photoresist composition comprising the same

The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

Chemically amplified positive resist composition

The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Zrepresents an organic cation, Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group, Rrepresents a divalent alicyclic hydrocarbon group pr the like, Rrepresents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Rand Reach independently represent a hydrogen atom or an aliphatic hydrocarbon group, Rrepresents an aliphatic hydrocarbon group, Rrepresents a divalent aliphatic hydrocarbon group, and Rrepresents an aliphatic hydrocarbon group.

Chemically amplified resist composition and salt employed therein

A salt represented by the formula (I0): wherein Qand Qeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a divalent C1-C17 hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, m represents 1 or 2, and Zrepresents m-valent organic or inorganic cation.

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Ikeda, Japan

Isao Yoshida