National Institute for Materials Science

National Research Institute for Metals

Other

Japan Science and Technology Corporation

Anelva Corporation

National Space Development Agency of Japan

Isao Nakatani

Kiyoshi Ozawa

Tsutomu Takahashi

Masayuki Hijikata

Takao Furubayashi

Satoshi Takahashi

Isao Nishida

Naoko Matsui

Kiyosho Ozawa

Kimiko Mashimo

Hiroaki Hanaoka

The problems can be solved by using a method for producing a metal nanoparticle colloid, which comprises the steps of S: mixing, into a nonpolar hydrocarbon oil having a vapor pressure of 10Torr or less at room temperature, organic molecules having both a hydrophilic group and a lipophilic group and having in the end of the hydrophilic group an N, S, P, or O atom or having at the hydrophilic group a functional group of an NHgroup, an NH group, an SH group, a PO group, or an OH group to prepare a base liquid, and S: placing the base liquid in a rotatable vacuum drum and charging a non-magnetic metal material in a crucible provided in the vacuum drum, and depositing the vapor of the non-magnetic metal material on the base liquid which adheres to the inner wall of the vacuum drum and rotates together with the rotating drum under conditions such that the inside of the vacuum drum is under a reduced pressure and the vacuum drum is rotated, and a task of the present invention is to provide a method for producing a metal nanoparticle colloid having non-magnetic metal nanoparticles having various shapes.

Method for producing a metal nanoparticle colloid

The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.

Masking material for dry etching

A method for producing an alloy fine particle colloid by heating and evaporating a raw material binary alloy which is in a solid state in an ambient temperature and pressure environment in a reduced-pressure environment, cooling a generated vapor for condensation and solidification and collecting a formed alloy fine particle in a liquid medium, wherein (1) when an atomic fraction of a component element in the raw material alloy is defined as X, a component ratio of each of the elements of the raw material alloy is regulated such that a fraction of a vapor pressure of the component element to the total vapor pressure of the raw material alloy falls within the range of from (X&#x2212;0.1) to (X+0.1); and (2) the raw material binary alloy is an alloy species which forms a homogeneous alloy phase in an alloy ingot. Thus, an alloy fine particle colloid is rationally and efficiently produced.

Method for producing alloy fine particle colloid

A colloidal solution of fine particles of metal or alloy having an average grain size of 10 nm or more is provided which is heat treated to cause coloration, or a metal colloidal pigment having inherent color, a conductive paste material or a conductive ink for printed substrate electronic parts or the like based on a colloid prepared by dispersing fine metal particles at high concentration in a liquid is provided.

Fine metal particle colloidal solution, conductive paste material, conductive ink material, and process for producing the same

A metallic thin film of copper, silver, gold, or one alloy selected from alloys containing as a main component at least one of these metals is etched by plasma of an etching gas containing at least nitrogen oxide while being reacted with the plasma, whereby making it possible to fine-process electrically conductive materials, heat-transfer materials and electric-contact materials made of copper, silver, gold or an alloy containing as a main component at least one of these metals.

Dry etching

An apparatus for reactive-ion etching including a reaction vessel and metallic parts disposed in the reaction vessel, the whole or a part of which includes at least one metallic material selected from the group consisting of titanium, aluminum, and an alloy including at least one of them as a main component.

Method for reactive ion etching and apparatus therefor

The invention provides a method for reactive-ion etching a magnetic material with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, the method comprising a step, in which a multilayered film comprising a magnetic material thin film having thereon a resist film formed on a substrate is exposed to an electron beam and then developed, to form a pattern on the resist film, a step, in which a mask material is vacuum deposited, a step, in which the resist is dissolved, to form a mask, and a step, in which a part of the magnetic material thin film that is not covered with the mask is removed by reactive ion etching with a plasma of a mixed gas of carbon monoxide and a nitrogen-containing compound, to form a pattern on the magnetic material thin film, and thus obtaining the magnetic material thin film finely worked.

A seed crystal is connected with a polycrystal at one end of the polycrystal, the connected crystal material is melted under a zero-gravity or microgravity environment without any container, and a single crystal is grown.

Method of production of single crystal

A method of manufacturing a fine-particle colloid or a magnetic fluid of a metal nitride through reaction between a metal carbonyl and a nitride-bearing compound, a two-step reaction is performed, comprising a first-step reaction of synthesizing a nitrogen-bearing metal carbonyl which is a precursor substance and a second-step reaction of synthesizing metal nitride from said precursor substance. A step of eliminating unreacted metal carbonyl is provided between the two-step reaction. By repeatedly causing the series of reactions, a fine-particle colloid or a magnetic fluid of the metal nitride is manufactured. For the magnetic fluid, the solvent may be replaced in response to a particular purpose of use of application after production.

Method of manufacturing fine-particle colloid or magnetic fluid

A compound containing nitrogen is introduced into a solvent in which a metal carbonyl and a surface active agent are dissolved, and the solution is heated to generate a particle colloid or a magnetic fluid of a metal nitride. A particle colloid of a metal nitride with an even grain size, a good dispersibilitgy and a good fluidity, and a magnetic fluid thereof with an excellent properties are obtained with convenience and at high efficiency.

Method of manufacturing particle colloid or a magnetic fluid containing

A process for producing fibers of a transition metal boride, which comprises reacting a mixture of a vapor of an evaporable boron compound an a vapor of an evaporable transition metal compound in the presence of a catalyst composed of at least one metal selected from the group consisting of Pt, Pd, Cu, Au and Ni.

Process for producing transition metal boride fibers

A plasma CVD apparatus having a rotary vacuum reaction vessel, a starting gas introducing port, an ambient gas introducing port, an exhaust port, electrodes or an induction coil for applying a high-frequency electric field, and a cooling pipe provided in the starting gas introducing port for cooling the starting gas introducing port, wherein the starting gas introducing port and the exhaust port are located in opposition to each other on a rotating axis of the reaction vessel.

Growing community of inventors

Ibaraki, Japan

Isao Nakatani