Tokyo Electron Limited

Tokyo Electron Yamanashi Limited

Isao Kobayashi

Kazuya Nagaseki

Akira Koshiishi

Keizo Hirose

Masayuki Tomoyasu

Kosuke Imafuku

Ryo Nonaka

Yukio Naito

Shosuke Endo

Kazuhiro Tahara

Yoshio Fukasawa

Hiroshi Tsuchiya

A plasma processing apparatus comprises a chamber, and an upper electrode and a lower electrode, parallelly provided in the chamber to oppose each other at a predetermined interval, for defining a plasma generation region between the electrodes. An object to be processed is mounted on the lower electrode. RF powers are supplied to the electrodes, so that a plasma generates between the electrodes, thereby performing a plasma process with respect to the object to be processed. A cylindrical ground electrode is provided around the plasma generation region in the chamber, for enclosing the plasma in the plasma generation region, and has a plurality of through holes for passing a process gas.

Plasma processing apparatus

A handling apparatus comprises a holding member for holding an object to be handled, a driving member for driving the holding member, a locus detection section provided in a fixed position which is not driven by the driving member, the locus detection section representing a locus along which the holding member is to move, and a sensor, provided on said holding member, for detecting the locus. The locus of the holding member is constantly detected by the sensor during the operation of the holding member, and, when the holding member is displaced from a predetermined locus, the operation of the handling apparatus is suddenly stopped. Then, the holding member is moved to a position where the locus detection section can be detected by the sensor, and the holding member is restored to an initial position.

Handling apparatus

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Yamanashi-ken, Japan

Isao Kobayashi